BACKGROUND
[0001] Applicants' invention relates generally to devices for protecting electrical equipment
and to methods of making such devices, which devices are commonly referred to as "surge
protection" or "transient voltage suppression" devices. Transient voltage protection
devices were developed in response to the need to protect the ever-expanding number
of electronic devices upon which today's technological society depends from high voltages.
Electrical transient voltages can be created by, for example, electrostatic discharge
or transients propagated by human contact. Examples of electrical equipment which
typically employ transient voltage protection equipment include, telecommunications
systems, computer systems and control systems.
[0002] Recent developments in transient voltage protection technology have centered around
usage of a material having a variable impedance which interconnects, for example,
a signal conductor with a ground conductor. The variable impedance material exhibits
a relatively high resistance (referred to herein as the "off-state") when the voltage
and/or current passing through the signal conductor is within a specified range, during
which time the signal conductor is ungrounded.
[0003] If, however, the signal conductor experiences a voltage which exceeds the threshold
for which the variable impedance material (and the transient voltage protection device
generally) has been designed, then the electrical characteristics of the variable
impedance material will change such that the material exhibits a relatively low impedance
(referred to herein as the "on-state"). At this time, the pulse or transient voltage
experienced by the signal conductor will be shunted to the ground conductor, and the
voltage associated with the pulse will be clamped at a relatively low value for the
duration of the pulse. In this way, the circuitry associated with the signal conductor
is protected.
[0004] The variable impedance material will recover after the voltage or current pulse has
passed and return to its high impedance state. Thus, the signal conductor and associated
circuitry can continue normal operation shortly after the pulse has ended.
[0005] Different types of variable impedance materials, also sometimes referred to as "overstress
responsive compositions", are known in the art. These materials can, for example,
be fabricated as a mixture of conductive and/or semiconductive particles suspended
as a matrix within a binding material, which can, for example, be an insulative resin.
Numerous examples of these types of materials can be found in the patent literature
including U.S. Patent Nos. 5,393,596 and 5,260,848 to Childers, U.S. Patent Nos. 4,977,357
and 5,068,634 to Shrier and U.S. Patent No. 5,294,374 to Martinez.
[0006] U.S. Patent No. 5,278,535 to Xu et al. describes an electrical overstress pulse protection
device which employs a variable impedance material. Specifically, Xu et al. provide
a thin flexible laminate for overlay application on the pins of a connector. The laminate
includes an electrically insulating substrate, a conductive lamina of apertured pin
receiving pads, a separate ground strip adjacent the pads, and an electrically insulating
cover. An electrical overstress pulse responsive composite material is positioned
such that it bridges the pads and the ground strip.
[0007] This patent to Xu et al., however, uses conventional semiconductor fabrication techniques
to create the pulse protection device including forming the substrate from a conventional
resin material, e.g., of the type typically used for substrates of printed circuit
boards. Similarly, Xu et al. describe forming the conductive elements using etching
techniques, which are also well known in the semiconductor fabrication. While these
techniques may be appropriate when working with thin film metal conductors, Applicants
have determined that other techniques and materials are more desirable when manufacturing
signal and ground conductive elements having a greater thickness, e.g., on the order
of 0.5-1.0 mils (0.0127 mm to 0.0254 mm), or more.
[0008] US-A-3 676 742 discloses a transient overvoltage protection device comprising a substrate
with conductive lines thereon for connecting electrical components and with a spark
gap which is filled with air or glass.
[0009] US-A-4 586 105 discloses a high-voltage protection device with a tape-covered spark
gap of 2.5 to 15 mils (0.0635 to 0.381 mm) between the discharge points.
SUMMARY
[0010] When forming a gap between a signal conductor and a ground conductor that is to be
filled with a variable impedance material, Applicants have discovered that repeatable
precision of the gap dimensions are important to producing a commercially desirable
product. The precision of the gap dimensions are significant because the electrical
characteristics of the device, e.g., the trigger voltage, clamp voltage and current
density, are, in part, determined by the size and shape of the gap.
[0011] Accordingly, it would be desirable to develop new techniques for making transient
voltage protection devices wherein the gap between a signal conductor and a ground
conductor is formed with a high degree of precision, which precision is repeatable
in a manufacturing environment and yet techniques are not so expensive that the resulting
transient voltage protection devices cannot compete on a cost basis in the marketplace.
At the same time, it would be desirable to optimize the materials used to make such
devices to achieve these same objectives. These objects are achieved with the features
of the claims.
[0012] According to an exemplary embodiment of the present invention, a method for fabricating
a transient voltage protection device including, for example, a ground conductor and
at least one other conductor comprises the steps of: providing a substrate;
forming a conductive layer on the substrate; and dicing the conductive layer on the
substrate to create a gap which separates the conductive layer into at least the ground
conductor and the at least one other conductor. The substrate can be formed from a
ceramic material or non-ceramic materials such as FR-4. If a ceramic material is used
for the substrate, then it is preferable that such a ceramic material have a density
of less than about 3.8 gms/cm
3. For example, forsterite and calcium borosilicate are two such ceramic materials.
Dicing to create the gap can be accomplished, for example, using a diamond dicing
saw having, for example, diamond particles of preferably no more than 5 microns in
size.
[0013] According to another exemplary embodiment of the present invention, a device comprises
a ceramic substrate having a density of less than about 3.8 gms/cm
3, a ground conductor and at least one other conductor formed on the ceramic substrate
such that they are substantially co-planar and are separated from one another by a
gap; and a variable impedance material disposed within the gap and in contact with
both the ground conductor and the at least one other conductor. The ceramic substrate
will preferably have a bulk density of less than 3.5 gms/cm
3 and optimally a density of less than 3.0 gms/cm
3. In particular, Applicants have identified forsterite (2MgSiO
2) having a bulk density of 2.8 gms/cm
3 and calcium borosilicate, having a bulk density of 2.5 gms/cm
3 as materials which are well suited for substrates according to the present invention.
By selecting ceramic or glass-based materials in accordance with the present invention,
the gap between the ground and signal conductor can be precisely formed with the desired
dimensions and good edge acuity.
BRIEF DESCRIPTION OF THE DRAWINGS
[0014] The features and advantages of Applicants' invention will be understood by reading
this description in conjunction with the drawings, in which:
Figure 1A illustrates a portion of a discrete transient voltage protection element;
Figure 1B illustrates the discrete transient voltage protection element of Figure
1A including the variable impedance material;
Figures 2A-2D depict discrete transient voltage protection elements at various stages
of manufacture used to illustrate methods of making such elements according to the
present invention;
Figure 3 illustrates a diamond dicing saw used to dice a gap between conductors according
to the present invention;
Figures 4A-4F illustrate a transient voltage protection device according to the present
invention which is adapted to be attached to a connector: and
Figure 5 illustrates a graph of current and voltage associated with a test of a device
constructed in accordance with the present invention.
DETAILED DESCRIPTION
[0015] An exemplary embodiment of the present invention is depicted in Figures 1A and 1B.
which Figures are used to explain the terminology used herein. Figure 1 shows a discrete
transient voltage protection element, i.e., a transient voltage protection element
which can be used as part of a circuit board, however other applications of the present
invention are contemplated, e.g., using transient voltage protection devices according
to the present invention as part of a connector. The discrete transient voltage protection
element includes a substrate 10 on which two conductors 12 and 14 are formed. In this
example, conductor 12 is the ground conductor, while conductor 14 is a signal or power
carrying conductor. A gap 16 is formed between conductors 12 and 14. Note that although
Figure 1A illustrates the gap as extending to the surface of substrate 10, preferred
embodiments of the present invention include extending the gap into the substrate.
As described above, the electrical characteristics of the transient voltage protection
element will depend, in part, on the precision with which gap 16 is formed. Thus,
precision of the depth, width and uniformity of edges 18 and 20 (referred to herein
as "edge acuity") associated with gap 16 is carefully controlled by way of the techniques
described below.
[0016] Figure 1B illustrates the discrete transient voltage protection element of Figure
1A, wherein a variable impedance material 22 fills the gap 16. According to the present
invention, any known variable impedance material may be used, including those described
in the above-mentioned patents, as well as those fabricated from dielectric polymers,
glass, ceramic or composites thereof. These materials may, for example, include or
be mixed with conductive and/or semiconductive particles in order to provide the desired
electrical characteristics. Although any variable impedance material can be used,
a currently preferred variable impedance material is that manufactured by SurgX Corporation
and identified by SurgX as Formulation #F1-6B.
[0017] Having briefly described the structure of an exemplary discrete transient voltage
protection element according to the present invention, a method for manufacturing
transient voltage protection devices will now be described with respect to Figures
2A-2F. Many such devices can be fabricated on a single wafer. The process begins by
selecting a suitable material for the substrate wafer 30. Although illustrated as
a rectangle for simplicity in Figure 2A, those skilled in the art will appreciate
that the shape of the wafer provided by a wafer manufacturer may vary and can, for
example, be circular.
[0018] Since Applicants have discovered that forming the gap by dicing is a preferred technique
to form the desired precisely dimensioned gap between conductors, a ceramic or glass-based
material is preferred for substrate 30. Although the present invention contemplates
any and all ceramic materials and glass-based materials, it has been found that certain
ceramics and glass-based materials are optimal from a manufacturing point of view.
In particular, ceramic and glass-based materials should be selected which have a sufficiently
low density that a diamond dicing saw can create the gap (1) with sufficient edge
acuity and (2) without wearing out the saw so rapidly as to be economically unfeasible.
[0019] Based on their experimentation, Applicants have discovered that preferable ceramics
and/or glass-based materials will have a density of less than 3.8 gms/cm
3. preferably less than 3.5 gms/cm
3 and optimally a density of less than 3.0 gms/cm
3. In particular, Applicants have identified forsterite (2MgSiO
2) having a bulk density of 2.8 gms/cm
3 and calcium borosilicate, having a bulk density of 2.5 gms/cm
3 as materials which are well suited for substrates according to the present invention.
However, those skilled in the art will appreciate that any ceramic, e.g., a material
within the ternary MgO-Al
2O
3-SiO
2 system or other materials having similar properties, or glass composite having a
sufficiently low bulk density and being otherwise amenable to dicing can be used as
a substrate in accordance with the present invention.
[0020] Having selected a suitable substrate 30, the next step, the result of which is illustrated
in Figure 2B, is to pattern the substrate with metallization. In this exemplary embodiment,
wherein discrete transient voltage protection devices are being manufactured, the
metallization can take the form of elongated lines 32 spaced apart on substrate 30
by areas 34. According to one exemplary embodiment of the present invention, the metallization
lines 32 can be formed by silk screening silver palladium onto the substrate 30. Of
course those skilled in the art will appreciate that other conductive materials could
be used including, for example, copper, gold, nickel, etc.
[0021] The width and thickness of the lines 32 can be chosen based on the capabilities desired
for the discrete transient voltage protection elements to be created. According to
one exemplary embodiment, Applicants have found that a width of about 0.040 inches
(1.016 mm) and a thickness of between 0.5 - 1.0 mils (0.0127-0.0254 mm), provide good
performance, however those skilled in the art will appreciate that these values are
purely for illustration herein.
[0022] Once the metallization has been formed on the substrate wafer 30, then the dicing
operations are performed to both form the gaps between the conductors and singulate
the substrate wafer 30 into its individual discrete transient voltage protection devices.
As mentioned above, Applicants have selected dicing over other techniques which could
be used to form the gap between the conductors, e.g., cutting the gap with a laser,
for its precision with respect to gap width, depth and edge acuity. Details of diamond
dicing techniques which can be used to cut the gaps and singulate the wafer substrate
30 are provided below.
[0023] In order to illustrate the diced gap formed between the two conductors, a single
discrete device cut from portion 36 of wafer substrate 30 is blown-up as Figure 2C.
This device was cut from wafer substrate 30 by dicing horizontally across the wafer
substrate 30 along the areas 34 and vertically across metallization 32. By dicing
a gap 40 completely through metallization 32 and partially through the wafer substrate
30 and two separate conductors 42 and 44 are formed, one of which can be grounded
when attached to a printed circuit board (not shown).
[0024] The gap 40 can be diced so as to have any desired width, for example, between 0.5
and 3.0 mils (0.0127 and 0.0762 mm), preferably between 0.8 and 1.1 mils (0.0203 and
0.02794 mm) and most preferably about 1 mil (0.0254 mm). Those skilled in the art
will appreciate that other gap widths may be desired, for example the gap width can
be increased to increase the clamp voltage or simply to render manufacturing less
complex, and that such variations are within the scope of the present invention. The
device can then be terminated by capping each end with a conductive material 46.
[0025] The gap is then filled with a variable impedance material 48 as illustrated in Figure
2D. As mentioned above, any known variable impedance material can be used, however
the currently preferred material is available from SurgX Corporation and is identified
as their formulation #F1-6B. In the exemplary embodiment illustrated in Figure 2D,
a circular portion of the variable impedance material 48 can be applied to bridge
the gap 40 and have an approximately circular footprint thereon of approximately 0.050
inches (1.27 mm). According to one exemplary embodiment, the variable impedance material
48 is forced into the gap 40 using a syringe so that the material substantially completely
fills gap 40. To ensure that the variable impedance material 48 contacts substantially
the entire surface area of the gap edges of each conductor (i.e., edges 18 and 20
in Figure 1), the gap 40 can be diced below the surface of the substrate wafer 30.
For example, the gap can extend about 0.005 inches (0.127 mm) beyond the metallization
into the substrate wafer 30.
[0026] Dicing is the preferred technique for forming the gap between the conductors into
which the variable impedance material is introduced due to the precision with which
the gap can thus be manufactured, amongst other reasons. Dicing involves applying
a compressive force to a material such that it chips away to form an opening. Thus,
in order to obtain a gap with sufficient precision in terms of width, depth and edge
acuity, the parameters of the dicing operation should be carefully controlled. According
to exemplary embodiments of the present invention, a diamond dicing saw is used as
illustrated in Figure 3.
[0027] The saw includes a saw hub 50 and a spindle 52 on which the saw blade 54 is rotatably
mounted. Alternatively, a hubless saw can be used. The saw blade 54 can, for example
be 1 mil (0.0254 mm) thick and is, preferably, electroplated with a solution of nickel
and diamond particles. The size of the diamond particles affects the size of the chips
and, thus, the edge acuity. Accordingly, Applicants have found that the diamond particles
should preferably be 5 microns or less. Other dicing parameters will also impact the
precision of the gap. In particular, the exposure ("E" in Figure 3) of the blade 54
beyond the hub 50 should be minimized to avoid blade wobble and associated inaccuracies
in the gap width. Moreover, the feed speed of the substrate through the saw and the
spindle speed of the blade should also be considered as will be appreciated by those
skilled in the art.
[0028] While the foregoing exemplary embodiments have been described in terms of discrete
transient voltage protection elements which can be incorporated directly into printed
circuit boards, those skilled in the art will also appreciate that the present invention
can be applied to any physical transient voltage protection device construction. For
example, the manufacturing steps described previously for producing and dividing a
plurality of discrete devices from a large wafer also can be used to produce a through-hole
electrical protection device for use with any of a variety of electrical connectors,
for example, an RJ-type (i.e., telephone) connector, a D-Sub connector (i.e., multiple
pin computer cable connectors), etc. Such electrical protection devices will have
substantially the same structural characteristics in all of the electrical connectors
except for variations in the shape/size and circuit pattern as will be appreciated
by those skilled in the art.
[0029] For each connector, the connector-related device will be used to permit at least
one connector pin to pass through a through-hole in the device, at least one ground
pin passing through at least one ground through-hole in the device, and the ground
through-hole(s) in the device will be electrically isolated from the other through-hole(s)
until an over-voltage condition is experienced. As an example of this type of embodiment
of the present invention, therefore, only a protection device for an RJ-11 type connector
will be described for illustrative purposes.
[0030] Figure 4A depicts a transient voltage protection device for an RJ-11 type connector
according to an exemplary embodiment of the present invention. Therein, a ceramic
or glass-based substrate 60 has a metallization layer 62 screened thereon as described
above. However, in this exemplary embodiment, the conductors are patterned to provide
for through-holes which will mate with the pins of an RJ-11 type connector when the
device is attached thereto. Next, as illustrated in Figure 4B, two gaps 64 and 66
are diced through the metallization layer 62 and partially through the substrate 60.
This has the affect of separating the six conductive portions surrounding the through-hole
areas from a central conductive "bus" 68. Subsequently, as shown in Figure 4C, a conductive
material 70 is disposed between the conductor surrounding through-hole area (i.e,.
the through-hole for the ground pin of the RJ-11 connector) and the conductive "bus"
68. This establishes conductive "bus" 68 as a grounded plane which is proximate each
of the conductors associated with the other through-hole areas. An alternative embodiment
is illustrated in Figure 4D, wherein the pins, e.g., pin 67, mate with saddles, e.g.,
saddle 69, formed in the ceramic substrate 60. To provide a firm electrical and/or
mechanical connection between the pins and the saddles, the pins can be soldered to
the metallized surfaces of the saddles, as represented by solder patch 71.
[0031] In either embodiment, a variable impedance material 74 is deposited over the area
including the gaps 66 and 64 and forced into the gap to provide an over-voltage responsive
electrical connection between the conductive "bus" 68 and each of the conductors 76-84,
each of which will be associated with a corresponding pin of the RJ-11 connector to
which the device is attached. Lastly, an encapsulating material 86 can be provided
to cover the variable impedance material 74 to, for example, protect the variable
impedance material and prevent electrical charges from other circuitry from being
applied across the variable impedance material.
[0032] The through-holes can be made in the area 72 and within conductors 76-84 by drilling,
laser micromachining or other methods recognized by those skilled in the art. The
size of the through-holes will depend on the diameter of the leads extending from
the particular connector. For example, the through-hole hole diameter can range from
20 mils to 40 mils (0.508 mm to 1.016 mm), but more typically are 30 mils (0.762 mm)
in diameter. The device 88 illustrated in Figure 4E, as well as other exemplary embodiments
wherein the transient voltage suppression device is intended to be used in connection
with a connector having pins or leads, can then be mounted in mating relationship
with the pins or leads and the substrate can be affixed to the connector body using
solder or other adhering techniques.
[0033] Figure 5 is a graph of current through, and voltage across, a device constructed
in accordance with the present invention as illustrated and described with respect
to Figures 2A-2D. Therein, as an input, Applicants applied a 1000-4-2 standard 8 kV
pulse as specified by the Electrotechnical Commission (IEC). This standard pulse is
intended to simulate the pulse which would be applied to electrical circuitry by the
discharge of static electricity associated with a human body. In the graphs, the upper
waveform (I) represents the current conducted by the transient voltage suppression
device, which flows into ground, while the lower waveform depicts the voltage across
the device during the test.
[0034] In the particular test illustrated in Figure 5, the device triggered (i.e., entered
its on-state) at 188 V. The pulse was clamped at 41.3 V and peak current was 42.8
A. Thus, when compared with conventional transient voltage protection devices, devices
constructed in accordance with the present invention can be seen from Figure 5 to
rapidly limit the transient voltage to a value which is substantially less than that
of the prospective pulse value. Additionally, devices constructed in accordance with
the present invention exhibit relatively low leakage current and low capacitance.
[0035] It is, of course, possible to embody the invention in specific forms other than those
described above without departing from the invention. The embodiments described above
are merely illustrative and should not be considered restrictive in any way. For example,
although the dicing of the gap was described above as being performed at the same
time that the wafer cut into individual devices, the dicing of the gap could be performed
at a later stage, i.e., each device could be individually gapped. Moreover, although
the preceding exemplary embodiments focus on ceramic and glass-based substrates, dicing
techniques could also be used to create gaps between conductors in other substrates
such as resin materials (e.g., FR-4) etc.
[0036] The scope of the invention is determined by the claims rather than the preceding
description, and all variations and equivalents which fall within the scope of the
claims are intended to be embraced therein.
1. Verfahren zur Herstellung einer Vorrichtung zum Schutz vor transienten Spannungen,
mit den Schritten:
(a) Ausbilden von leitenden Leitungen (32) auf einem Scheibensubstrat (30), wobei
die Leitungen Leitungswege zwischen elektronischen Komponenten bilden;
(b) Ausbilden eines Spalts (16, 40) von 3 mil (0,0762 mm) oder weniger in mindestens
einer der Leitungen (32) durch Trennen der Leitung mit einer Säge oder einem Laser,
so daß zwei durch den Spalt (16, 40) getrennte Leiter (42, 44) ausgebildet werden;
(c) Überziehen des Spalts (16, 40), um eine Kontamination des Luftraums im Spalt zu
verhindern, oder Füllen des Spalts mit einem impedanzvariablen Material (48), z. B.
einem sauberen ungefüllten Polymer oder Glas oder Keramik oder von Verbundstoffen
daraus;
(d) Sägen des Substrats (30), wobei das Substrat in einzelne Einheiten zum Schutz
vor transienten Spannungen getrennt wird, die jeweils zwei durch den Spalt getrennte
Leiter (42, 44) aufweisen;
(e) Abdecken der Enden (46) jedes Leiters (42, 44) der einzelnen Einheiten zum Schutz
vor transienten Spannungen mit leitendem Material, so daß die elektrische Trennung
der Leiter durch den Spalt erhalten bleibt.
2. Verfahren nach Anspruch 1, wobei der Spalt kleiner als etwa 1 mil (0,0254 mm) ist.
3. Vorrichtung zum Schutz vor transienten Überspannungen mit:
(a) einem Substrat (60) mit einer leitenden Schicht (62) mit zwei Spalten (64, 66),
die einen mittigen leitenden Bus (68) zwischen sich definieren, und leitenden Abschnitten
(76 bis 84) auf beiden Seiten des mittigen leitenden Busses (68), die so bemessen
sind, daß sie mit den Verbinderanschlußstiften oder Leitungen (67) ineinandergreifen,
wobei
(b) die Spalte (64, 66) dafür angepaßt sind, den leitenden Bus (68) von den leitenden
Abschnitten (76 bis 84) mit Durchgangslöchern (72) oder Schalen (69) für die Anschlußstifte
oder Leitungen des Verbinders zu trennen, und
(c) die Spalte (64, 66) mit einem impedanzvariablen Material (74) gefüllt sind, um
eine überspannungsempfindliche elektrische Verbindung zwischen dem leitenden Bus (68)
und jedem der leitenden Abschnitte (76 bis 84) herzustellen.
4. Vorrichtung nach Anspruch 3, wobei die Breite der Spalte (64, 66) kleiner ist als
1 mil (0,0254 mm).