(19)
(11) EP 1 014 437 B8

(12) CORRECTED EUROPEAN PATENT SPECIFICATION
Note: Bibliography reflects the latest situation

(15) Correction information:
Corrected version no 1 (W1 B1)

(48) Corrigendum issued on:
31.12.2008 Bulletin 2009/01

(45) Mention of the grant of the patent:
17.09.2008 Bulletin 2008/38

(21) Application number: 99309084.4

(22) Date of filing: 16.11.1999
(51) International Patent Classification (IPC): 
H01L 21/66(2006.01)
 H01L 23/544(2006.01)

(54)

In-situ measurement method and apparatus for semiconductor processing

In-situ Messmethode und Halbleiterherstellungsapparat

Methode de mesurement in-situ et appareil de fabrication de semi-conducteurs

(84) Designated Contracting States:
DE GB IE

(30) Priority: 16.11.1998 US 192698

(43) Date of publication of application:
28.06.2000 Bulletin 2000/26

(73) Proprietors:
  • Qimonda AG
    81739 München (DE)
  • International Business Machines Corporation
    Armonk, NY 10504 (US)

(72) Inventors:
  • Flietner, Bertrand
    Hopewell Junction, NY 12533 (US)
  • Muller, K. Paul
    Wappingers Falls, NY 12590 (US)

(74) Representative: O'Connell, David Christopher et al
HASELTINE LAKE, Redcliff Quay 120 Redcliff Street
Bristol BS1 6HU
Bristol BS1 6HU (GB)


(56) References cited: : 
US-A- 5 444 637
 US-A- 5 594 328
   
  • FREED M ET AL: "AUTONOMOUS ON-WAFER SENSORS FOR PROCESS MODELING, DIAGNOSIS, AND CONTROL" IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, IEEE INC, NEW YORK, US, vol. 14, no. 3, August 2001 (2001-08), pages 255-264, XP001081192 ISSN: 0894-6507
  • LUKASZEK W ET AL: "Characterization of wafer charging mechanisms and oxide survival prediction methodology" RELIABILITY PHYSICS SYMPOSIUM, 1994. 32ND ANNUAL PROCEEDINGS., IEEE INTERNATIONAL SAN JOSE, CA, USA 11-14 APRIL 1994, NEW YORK, NY, USA,IEEE, 11 April 1994 (1994-04-11), pages 334-338, XP010117197 ISBN: 0-7803-1357-7
   
Note: Within nine months from the publication of the mention of the grant of the European patent, any person may give notice to the European Patent Office of opposition to the European patent granted. Notice of opposition shall be filed in a written reasoned statement. It shall not be deemed to have been filed until the opposition fee has been paid. (Art. 99(1) European Patent Convention).