(19)
(11) EP 1 021 750 A1

(12)

(43) Date of publication:
26.07.2000 Bulletin 2000/30

(21) Application number: 98944729.7

(22) Date of filing: 03.09.1998
(51) International Patent Classification (IPC)7G03F 7/039
(86) International application number:
PCT/US9818/353
(87) International publication number:
WO 9914/635 (25.03.1999 Gazette 1999/12)
(84) Designated Contracting States:
AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE

(30) Priority: 12.09.1997 US 928900

(71) Applicant: THE B.F. GOODRICH COMPANY
Richfield,Ohio 44286-9368 (US)

(72) Inventors:
  • GOODALL, Brian, L.
    Akron, OH 44333 (US)
  • JAYARAMAN, Saikumar
    Twinsburg, Ohio44087 (US)
  • SHICK, Robert, A.
    Strongsville, OH 44136 (US)
  • RHODES, Larry, F.
    Silver Lake, OH 44224 (US)
  • ALLEN, Robert, David
    San Jose, CA 95120 (US)
  • DI PIETRO, Richard, Anthony
    San Jose, CA 95120 (US)
  • WALLOW, Thomas
    Union City, CA 94587 (US)

(74) Representative: von Kreisler, Alek, Dipl.-Chem. et al
Patentanwälte,von Kreisler-Selting-Werner,Bahnhofsvorplatz 1 (Deichmannhaus)
50667 Köln
50667 Köln (DE)

   


(54) PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS