Stereolithographic method and apparatus for production of three dimensional objects using multiple beams of different diameters

(19)

(11)

EP 1 025 981 A3

(12)	EUROPEAN PATENT APPLICATION

(88)	Date of publication A3:
	05.12.2001 Bulletin 2001/49

(43)	Date of publication A2:
	09.08.2000 Bulletin 2000/32

(21)	Application number: 00300967.7

(22)	Date of filing: 08.02.2000

(51)	International Patent Classification (IPC)⁷: B29C 67/00, G06T 17/00

(84)	Designated Contracting States:
	AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE
	Designated Extension States:
	AL LT LV MK RO SI

(30)

Priority:

08.02.1999 US 248352

(71)	Applicant: 3D SYSTEMS, INC.
	Valencia, California 91355 (US)

(72)	Inventors:
	Manners, Chris R. Moorpark, California 93021 (US) Guertin, Michelle D. Connecticut 06420 (US) Nguyen, Hop D. Quartz Hill, California 93536 (US) Partanen, Jouni P. Los Angeles, California 90031 (US) Tang, Nansheng Valencia, California 91355 (US) Everett, Michael A. Saugus, California 91350 (US)

(74)	Representative: Bluff, John William et al
	Lloyd Wise, Tregear & Co., Commonwealth House, 1-19 New Oxford Street London WC1A 1LW London WC1A 1LW (GB)

(54)	Stereolithographic method and apparatus for production of three dimensional objects using multiple beams of different diameters

(57) A rapid prototyping and manufacturing (e.g. stereolithography) method and apparatus for making three-dimensional objects on a layer by layer basis by selectively exposing layers of material to prescribed stimulation, using a beam having a first smaller diameter and a beam having a second larger diameter, to form laminae of the object. The power of the smaller beam is typically lower than the power of the larger beam. Object formation is controlled by data representing portions of the layers to be exposed with the larger beam (large spot portions) and those portions to be exposed with the smaller beam (small spot portions). In a preferred embodiment, portions exposed with the larger beam are formed first, for a given layer. Portions are exposed with the small beam next. Thereafter the entire perimeter of the laminae is traced using the small beam. Data manipulation techniques are used to identify which portions may be formed with the large beam to decrease exposure time and which should be formed with the small beam to maintain accuracy of the lamina being formed. More than two beam diameters may be used.

Search report