METHOD AND APPARATUS FOR MODELING SUBSTRATE REFLECTIVITY DURING CHEMICAL MECHANICAL POLISHING - Patent 1027576

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EP 1 027 576 A1

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(43)	Date of publication:
	16.08.2000 Bulletin 2000/33

(21)	Application number: 98939950.6

(22)	Date of filing: 14.08.1998

(51)	International Patent Classification (IPC)⁷: G01B 11/06, H01L 21/66

(86)	International application number:
	PCT/US9816/902

(87)	International publication number:
	WO 9923/449 (14.05.1999 Gazette 1999/19)

(84)	Designated Contracting States:
	DE GB

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Priority:

31.10.1997 US 962085

(71)	Applicant: Applied Materials, Inc.
	Santa Clara,California 95054 (US)

(72)	Inventor:
	WISWESSER, Andreas D-09599 Freiberg (DE)

(74)	Representative: Bayliss, Geoffrey Cyril
	BOULT WADE TENNANT,Verulam Gardens70 Gray's Inn Road London WC1X 8BT London WC1X 8BT (GB)

(54)	METHOD AND APPARATUS FOR MODELING SUBSTRATE REFLECTIVITY DURING CHEMICAL MECHANICAL POLISHING