APPARATUS AND METHODS FOR CONTROLLING WORKPIECE SURFACE EXPOSURE TO PROCESSING LIQUIDS DURING THE FABRICATION OF MICROELECTRONIC COMPONENTS - Patent 1029342

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EP 1 029 342 A1

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(43)	Date of publication:
	23.08.2000 Bulletin 2000/34

(21)	Application number: 98950863.5

(22)	Date of filing: 30.09.1998

(51)	International Patent Classification (IPC)⁷: H01L 21/00, C25D 21/12

(86)	International application number:
	PCT/US9820/743

(87)	International publication number:
	WO 9917/344 (08.04.1999 Gazette 1999/14)

(84)	Designated Contracting States:
	AT CH DE FR GB LI NL

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Priority:

30.09.1997 US 940517
30.09.1997 US 940523

(71)	Applicant: SEMITOOL, INC.
	Kalispell,Montana 59901 (US)

(72)	Inventors:
	BATZ, Robert, W., Jr. Kalispell, MT 59904 (US) BLACKBURN, Reed, A. Whitefish, MT 59937 (US) KELLY, Steven, E. Kalispell, MT 59901 (US) DOOLITTLE, James, W. Whitefish, MT 59937 (US)

(74)	Representative: Hitchcock, Esmond Antony
	Lloyd Wise, Tregear & Co.,Commonwealth House,1-19 New Oxford Street London WC1A 1LW London WC1A 1LW (GB)

(54)	APPARATUS AND METHODS FOR CONTROLLING WORKPIECE SURFACE EXPOSURE TO PROCESSING LIQUIDS DURING THE FABRICATION OF MICROELECTRONIC COMPONENTS