(19)
(11) EP 1 032 012 A3

(12) EUROPEAN PATENT APPLICATION

(88) Date of publication A3:
23.01.2002 Bulletin 2002/04

(43) Date of publication A2:
30.08.2000 Bulletin 2000/35

(21) Application number: 00301465.1

(22) Date of filing: 24.02.2000
(51) International Patent Classification (IPC)7: H01J 9/02
(84) Designated Contracting States:
AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE
Designated Extension States:
AL LT LV MK RO SI

(30) Priority: 25.02.1999 JP 4921899
26.02.1999 JP 5149799

(71) Applicant: CANON KABUSHIKI KAISHA
Tokyo (JP)

(72) Inventors:
  • Jindai, Kazuhiro
    Ohta-ku, Tokyo (JP)
  • Ohnishi, Toshikazu
    Ohta-ku, Tokyo (JP)

(74) Representative: Beresford, Keith Denis Lewis et al
BERESFORD & Co. 2-5 Warwick Court, High Holborn
London WC1R 5DH
London WC1R 5DH (GB)

   


(54) Electron-emitting device, electron source, and manufacture method for image-forming apparatus


(57) A method of manufacturing an electron-emitting device has a step of forming a pair of conductors on a substrate, the conductors being spaced from each other, and an activation process of depositing carbon or carbon compound on at least one side of the pair of conductors in an atmosphere of carbon compound gas. The activation process includes a plurality of processes of two or more stages including a first process and a second process. The first process is executed in an atmosphere of the carbon compound gas having a partial pressure higher than a partial of the second process used as a last activation process.






Search report