(19)
(11) EP 1 032 615 A1

(12)

(43) Date of publication:
06.09.2000 Bulletin 2000/36

(21) Application number: 99909365.1

(22) Date of filing: 19.03.1999
(51) International Patent Classification (IPC)7C09G 1/02
(86) International application number:
PCT/KR9900/123
(87) International publication number:
WO 0017/282 (30.03.2000 Gazette 2000/13)
(84) Designated Contracting States:
DE GB NL

(30) Priority: 22.09.1998 KR 9839212

(71) Applicant: Cheil Industries Inc.
Kumi-shi,Kyongsang-Pukdo 730-030 (KR)

(72) Inventors:
  • LEE, Kil, SungBoramae Samsung Apt. 103-1007
    Kwanak-kuSeoul 151-751 (KR)
  • LEE, Jae, Seok
    Euiwang-shiKyongki-do 437-070 (KR)
  • KIM, Seok, Jin
    Eunpyung-kuSeoul 122-081 (KR)
  • CHANG, Tu, Won
    Yusung-kuTaejon-shi 305-390 (KR)

(74) Representative: Kuhnen & Wacker 
Patentanwaltsgesellschaft mbH,Alois-Steinecker-Strasse 22
85354 Freising
85354 Freising (DE)

   


(54) PROCESS FOR PREPARING METAL OXIDE SLURRY SUITABLE FOR SEMICONDUCTOR CHEMICAL MECHANICAL POLISHING