(19)
(11) EP 1 032 723 A1

(12)

(43) Date of publication:
06.09.2000 Bulletin 2000/36

(21) Application number: 98957677.2

(22) Date of filing: 09.11.1998
(51) International Patent Classification (IPC)7: C23C 16/44, C23C 16/40, H01L 21/314
(86) International application number:
PCT/US9823/753
(87) International publication number:
WO 9925/895 (27.05.1999 Gazette 1999/21)
(84) Designated Contracting States:
BE DE FR GB IT NL

(30) Priority: 17.11.1997 US 971799

(71) Applicants:
  • SYMETRIX CORPORATION
    Colorado Springs, CO 80918 (US)
  • Primaxx, Inc.
    Allentown, PA 18106 (US)

(72) Inventors:
  • SOLAYAPPAN, Narayan
    Colorado Springs, CO 80917 (US)
  • MCMILLAN, Larry, D.
    Colorado Springs, CO 80909 (US)
  • PAZ DE ARAUJO, Carlos, A.
    Colorado Springs, CO 80919 (US)

(74) Representative: Schoppe, Fritz, Dipl.-Ing. 
Schoppe, Zimmermann & StöckelerPatentanwältePostfach 71 08 67
81458 München
81458 München (DE)

   


(54) METHOD AND APPARATUS FOR MISTED DEPOSITION OF THIN FILMS