METHOD AND APPARATUS FOR REDUCING THERMAL GRADIENTS WITHIN A CERAMIC WAFER SUPPORT PEDESTAL - Patent 1032945

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EP 1 032 945 A1

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(43)	Date of publication:
	06.09.2000 Bulletin 2000/36

(21)	Application number: 98953443.3

(22)	Date of filing: 13.10.1998

(51)	International Patent Classification (IPC)⁷: H01L 21/00

(86)	International application number:
	PCT/US9821/581

(87)	International publication number:
	WO 9925/005 (20.05.1999 Gazette 1999/20)

(84)	Designated Contracting States:
	BE DE FR GB NL

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Priority:

06.11.1997 US 965369

(71)	Applicant: Applied Materials, Inc.
	Santa Clara,California 95054 (US)

(72)	Inventor:
	BURKHART, Vincent, E. San Jose, CA 95129 (US)

(74)	Representative: Kahler, Kurt, Dipl.-Ing.
	PatentanwälteKahler, Käck, Fiener et col.,Vorderer Anger 268 86899 Landsberg/Lech 86899 Landsberg/Lech (DE)

(54)	METHOD AND APPARATUS FOR REDUCING THERMAL GRADIENTS WITHIN A CERAMIC WAFER SUPPORT PEDESTAL