(19)
(11) EP 1 063 706 A3

(12) EUROPEAN PATENT APPLICATION

(88) Date of publication A3:
13.07.2005 Bulletin 2005/28

(43) Date of publication A2:
27.12.2000 Bulletin 2000/52

(21) Application number: 00111986.6

(22) Date of filing: 19.06.2000
(51) International Patent Classification (IPC)7H01L 31/0288, H01L 31/18, C30B 15/00
(84) Designated Contracting States:
AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE
Designated Extension States:
AL LT LV MK RO SI

(30) Priority: 24.06.1999 JP 17855599

(71) Applicant: SHIN-ETSU CHEMICAL CO., LTD.
Chiyoda-ku, Tokyo (JP)

(72) Inventors:
  • Yamada, Toru
    2-13-1, Isobe, Annaka-shi, Gunma-ken (JP)
  • Tokunaga, Katsushi
    2-13-1, Isobe, Annaka-shi, Gunma-ken (JP)
  • Hirasawa, Teruhiko
    2-13-1, Isobe, Annaka-shi, Gunma-ken (JP)

(74) Representative: Wibbelmann, Jobst, Dr., Dipl.-Chem. 
Wuesthoff & Wuesthoff, Patent- und Rechtsanwälte, Schweigerstrasse 2
81541 München
81541 München (DE)

   


(54) Ga-doped multicrystalline silicon, Ga-doped multicrystalline silicon wafer and method for producing the same


(57) There are disclosed multi-crystalline silicon which is added with Ga (gallium) as a dopant and a method for producing Ga-doped multi-crystalline silicon, which comprises adding Ga to silicon melt in a crucible, which is melted by heating, and cooling the silicon melt to allow growth of multi-crystalline silicon. According to the present invention, there are provided multi-crystalline silicon and a multi-crystalline silicon wafer for producing solar cells showing stable conversion efficiency for light energy without causing photodegradation as well as methods for producing them.





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