(19)
(11) EP 1 068 019 A1

(12)

(43) Date of publication:
17.01.2001 Bulletin 2001/03

(21) Application number: 99915262.2

(22) Date of filing: 02.04.1999
(51) International Patent Classification (IPC)7B05B 1/34, H05G 2/00
(86) International application number:
PCT/US9907/429
(87) International publication number:
WO 9951/357 (14.10.1999 Gazette 1999/41)
(84) Designated Contracting States:
DE FR IT NL

(30) Priority: 03.04.1998 US 54977
03.04.1998 US 55024

(71) Applicant: Advanced Energy Systems, Inc.
Princeton, NJ 08540 (US)

(72) Inventors:
  • HAAS, Edwin, G.
    Sayville, NY 11782 (US)
  • GUTOWSKI, Robert, M.
    Glen Oaks, NY 11004 (US)
  • CALIA, Vincent, S.
    Greenlawn, NY 11740 (US)
  • OMAN, Richard, A.
    Huntington, NY 11743 (US)
  • TODD, Alan, M.
    Princeton Junction, NJ 08550 (US)
  • ABEL, Bruce, D.
    Sayville, NJ 11782 (US)
  • CHRISTINA, Vincent, A.
    Shoreham, NY 11786 (US)
  • HARTLEY, Richard, A., Jr.
    Burlington Township, NJ 08016 (US)
  • PEACOCK, Michael, A.
    Bay Shore, NY 11706 (US)

(74) Representative: Patry, Didier Marcel Pierre 
Baker Botts45 Ludgate Hill
London EC4M 7JU
London EC4M 7JU (GB)

   


(54) ENERGY EMISSION SYSTEM FOR PHOTOLITHOGRAPHY