FLUID NOZZLE SYSTEM , ENERGY EMISSION SYSTEM FOR PHOTOLITHOGRAPHY AND ITS METHOD OF MANUFACTURE - Patent 1068020

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EP 1 068 020 A1

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(43)	Date of publication:
	17.01.2001 Bulletin 2001/03

(21)	Application number: 99916360.3

(22)	Date of filing: 02.04.1999

(51)	International Patent Classification (IPC)⁷: B05B 1/34, H05G 2/00

(86)	International application number:
	PCT/US9907/414

(87)	International publication number:
	WO 9951/356 (14.10.1999 Gazette 1999/41)

(84)	Designated Contracting States:
	DE FR IT NL

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Priority:

03.04.1998 US 54831
03.04.1998 US 54987

(71)	Applicant: Advanced Energy Systems, Inc.
	Princeton, NJ 08540 (US)

(72)	Inventors:
	HAAS, Edwin, G. Sayville, NY 11782 (US) GUTOWSKI, Robert, M. Glen Oaks, NY 11004 (US) CALIA, Vincent, S. Greenlawn, NY 11740 (US)

(74)	Representative: Patry, Didier Marcel Pierre
	Baker Botts45 Ludgate Hill London EC4M 7JU London EC4M 7JU (GB)

(54)	FLUID NOZZLE SYSTEM , ENERGY EMISSION SYSTEM FOR PHOTOLITHOGRAPHY AND ITS METHOD OF MANUFACTURE