Exposure apparatus and device manufacturing method using the same

(19)

(11)

EP 1 069 477 A3

(12)	EUROPEAN PATENT APPLICATION

(88)	Date of publication A3:
	24.01.2001 Bulletin 2001/04

(43)	Date of publication A2:
	17.01.2001 Bulletin 2001/03

(21)	Application number: 00203428.8

(22)	Date of filing: 03.06.1997

(51)	International Patent Classification (IPC)⁷: G03F 7/20

(84)	Designated Contracting States:
	DE GB NL

(30)

Priority:

06.06.1996 JP 16512496

(62)	Application number of the earlier application in accordance with Art. 76 EPC:
	97303781.5 / 0811883

(71)	Applicant: CANON KABUSHIKI KAISHA
	Tokyo (JP)

(72)	Inventors:
	Inoue, Mitsuru Ohta-ku, Tokyo (JP) Ebinuma, Ryuichi Ohta-ku, Tokyo (JP) Iwamoto, Kazunori Ohta-ku, Tokyo (JP) Osanai, Eiji Ohta-ku, Tokyo (JP) Takeishi, Hiroaki Ohta-ku, Tokyo (JP)

(74)	Representative: Beresford, Keith Denis Lewis et al
	BERESFORD & Co. High Holborn 2-5 Warwick Court London WC1R 5DJ London WC1R 5DJ (GB)

(54)	Exposure apparatus and device manufacturing method using the same

(57) A scanning exposure apparatus wherein a portion of a pattern of an original is projected on to a substrate through a projection optical system (2) and wherein the original and the substrate are scanningly moved relatively to the projection optical system (2) whereby the pattern of the original is transferred on to the substrate. The apparatus includes an original stage (1) for holding the original, a base (9) for supporting the original stage (1), and a supporting system for supporting the base (9) at three positions, through dampers (11) and pillars (12).

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