(19)
(11) EP 1 070 157 A1

(12)

(43) Date of publication:
24.01.2001 Bulletin 2001/04

(21) Application number: 98915347.3

(22) Date of filing: 06.04.1998
(51) International Patent Classification (IPC)7C23G 1/02, C11D 1/40
(86) International application number:
PCT/US9806/907
(87) International publication number:
WO 9951/796 (14.10.1999 Gazette 1999/41)
(84) Designated Contracting States:
BE DE FR GB IE IT NL

(71) Applicant: Arch Specialty Chemicals, Inc.
Norwalk, Connecticut 06856-4500 (US)

(72) Inventors:
  • LEON, Vincent, G.
    Scottsdale, AZ 85250 (US)
  • HONDA, Kenji
    Barrington, RI 02806 (US)
  • ROTHGERY, Eugene, F.
    North Branford, CT 06471 (US)

(74) Representative: Bawden, Peter Charles 
Bawden & Associates,66a High Street
Harpenden,Hertfordshire AL5 2SP
Harpenden,Hertfordshire AL5 2SP (GB)

   


(54) METHOD FOR REMOVING PHOTORESIST AND PLASMA ETCH RESIDUES