(19)
(11)
EP 1 070 157 A1
(12)
(43)
Date of publication:
24.01.2001
Bulletin 2001/04
(21)
Application number:
98915347.3
(22)
Date of filing:
06.04.1998
(51)
International Patent Classification (IPC)
7
:
C23G
1/02
,
C11D
1/40
(86)
International application number:
PCT/US9806/907
(87)
International publication number:
WO 9951/796
(
14.10.1999
Gazette 1999/41)
(84)
Designated Contracting States:
BE DE FR GB IE IT NL
(71)
Applicant:
Arch Specialty Chemicals, Inc.
Norwalk, Connecticut 06856-4500 (US)
(72)
Inventors:
LEON, Vincent, G.
Scottsdale, AZ 85250 (US)
HONDA, Kenji
Barrington, RI 02806 (US)
ROTHGERY, Eugene, F.
North Branford, CT 06471 (US)
(74)
Representative:
Bawden, Peter Charles
Bawden & Associates,66a High Street
Harpenden,Hertfordshire AL5 2SP
Harpenden,Hertfordshire AL5 2SP (GB)
(54)
METHOD FOR REMOVING PHOTORESIST AND PLASMA ETCH RESIDUES