(19)
(11) EP 1 080 926 A3

(12) EUROPEAN PATENT APPLICATION

(88) Date of publication A3:
20.06.2001 Bulletin 2001/25

(43) Date of publication A2:
07.03.2001 Bulletin 2001/10

(21) Application number: 00118788.9

(22) Date of filing: 30.08.2000
(51) International Patent Classification (IPC)7B41J 2/355, B41C 1/14, B41J 2/35, B41J 2/345, B41J 2/335
(84) Designated Contracting States:
AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE
Designated Extension States:
AL LT LV MK RO SI

(30) Priority: 31.08.1999 JP 24583999
31.08.1999 JP 24584099
31.08.1999 JP 24623099

(71) Applicant: RISO KAGAKU CORPORATION
Tokyo (JP)

(72) Inventor:
  • Ryoichi, Imai,c/o Riso Kagaku Corp. R&D Center
    Inashiki-gun, Iberaki-ken (JP)

(74) Representative: Klunker . Schmitt-Nilson . Hirsch 
Winzererstrasse 106
80797 München
80797 München (DE)

   


(54) Method of and apparatus for making stencil


(57) A stencil is made by the use of a thermal head which has an array of resistance heater element arranged in a main scanning direction. The resistance heater elements are selectively driven while the stencil material is conveyed in a sub-scanning direction intersecting the main scanning direction so that perforations are formed in the stencil material in a predetermined size at a first pitch in the main scanning direction and a second pitch in the sub-scanning direction. The stencil material is perforated so that unperforated portions which continuously extend in one of the main scanning direction and the sub-scanning direction to separate perforations in the other of the main scanning direction and the sub-scanning direction are left in the stencil material.







Search report