(19)
(11) EP 1 084 513 A1

(12)

(43) Date of publication:
21.03.2001 Bulletin 2001/12

(21) Application number: 99925733.0

(22) Date of filing: 21.05.1999
(51) International Patent Classification (IPC)7H01L 21/768, C23C 16/18, C23C 16/56
(86) International application number:
PCT/US9911/272
(87) International publication number:
WO 9963/590 (09.12.1999 Gazette 1999/49)
(84) Designated Contracting States:
BE DE GB NL

(30) Priority: 05.06.1998 US 92477

(71) Applicant: Applied Materials, Inc.
Santa Clara,California 95054 (US)

(72) Inventors:
  • BHAN, Mohan, K.
    Cupertino, CA 95014 (US)
  • CHEN, Ling
    Sunnyvale, CA 94087 (US)
  • ZHENG, Bo
    San Jose, CA 95129 (US)
  • JONES, Justin
    San Francisco, CA 94115 (US)
  • GANGULI, Seshadri
    Santa Clara, CA 95051 (US)
  • LEVINE, Timothy
    Santa Clara, CA 95050 (US)
  • WILSON, Samuel
    Sunnyvale, CA 94086 (US)
  • CHANG, Mei
    Saratoga, CA 95070 (US)

   


(54) A METHOD FOR TREATING A DEPOSITED FILM FOR RESISTIVITY REDUCTION