(19)
(11) EP 1 088 337 A1

(12)

(43) Date of publication:
04.04.2001 Bulletin 2001/14

(21) Application number: 00918167.8

(22) Date of filing: 20.03.2000
(51) International Patent Classification (IPC)7H01L 21/00
(86) International application number:
PCT/US0007/394
(87) International publication number:
WO 0059/006 (05.10.2000 Gazette 2000/40)
(84) Designated Contracting States:
AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE

(30) Priority: 30.03.1999 US 281619

(71) Applicant: Koninklijke Philips Electronics N.V.
5621 BA Eindhoven (NL)

(72) Inventors:
  • ZHANG, Liming
    Sunnyvale, CA 94087 (US)
  • WELING, Milind, G.
    San Jose, CA 95131 (US)

(74) Representative: Smeets, Eugenius Theodorus J. M. 
INTERNATIONAAL OCTROOIBUREAU B.V.,Prof. Holstlaan 6
5656 AA Eindhoven
5656 AA Eindhoven (NL)

   


(54) SEMICONDUCTOR WAFER CLEANING APPARATUS AND METHOD