|
(11) | EP 1 107 064 A3 |
| (12) | EUROPEAN PATENT APPLICATION |
|
|
|
|
|||||||||||||||||||||||
| (54) | Exposure apparatus |
| (57) The exposure apparatus is one that is arranged to project one unit of circuit pattern
onto the surface of a resist on a substrate to be manufactured and to expose it over
the surface of this resist. The exposure apparatus thereby includes processing means
that enables forming a high-resolution circuit pattern image on the substrate by the
use of image display means able to ensure a wide display region without deteriorating
the resolution and that when dividing the one unit of circuit pattern into a plurality
of regions in order to ensure an inexpensive, reliable exposure operation divides
it so that adjacent ones of the divided regions may partly overlap each other, exposure
means that has equipped therein a plurality of optical systems each of that projects
one of a plurality of the divided regions onto the surface of the resist on the substrate,
and control means that using the exposure means causes a plurality of the divided
regions to be simultaneously projected on the surface of the resist in such a way
as to cause duplex regions between the adjacent regions to overlap each other on the
surface of the resist on the substrate to thereby cause the one unit of circuit pattern
image to be formed on the surface of the resist on the substrate. |