METHOD AND APPARATUS FOR DEVELOPING PHOTORESIST PATTERNS

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EP 1 114 355 B8

(12)	CORRECTED EUROPEAN PATENT SPECIFICATION
	Note: Bibliography reflects the latest situation

(15)	Correction information:
	Corrected version no 1 (W1 B1)

(48)	Corrigendum issued on:
	19.01.2011 Bulletin 2011/03

(45)	Mention of the grant of the patent:
	03.11.2010 Bulletin 2010/44

(21)	Application number: 99945422.6

(22)	Date of filing: 01.09.1999

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International Patent Classification (IPC):

G03F 7/30^(2006.01)
B05D 1/00^(2006.01)

B05C 11/08^(2006.01)

(86)	International application number:
	PCT/US1999/020115

(87)	International publication number:
	WO 2000/016163 (23.03.2000 Gazette 2000/12)

(54)	METHOD AND APPARATUS FOR DEVELOPING PHOTORESIST PATTERNS VERFAHREN UND GERÄT ZUM ENTWICKELN VON FOTORESISTMUSTERN RENDEMENT ET PERFORMANCE AMELIORES DE LIGNE DE TRAIT POUR POLYMERES LIQUIDES ET AUTRES MATERIAUX

(84)	Designated Contracting States:
	DE FR

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Priority:

17.09.1998 US 100738 P
28.12.1998 US 221060

(43)	Date of publication of application:
	11.07.2001 Bulletin 2001/28

(73)	Proprietor: ASML Holding N.V.
	5504 DR Veldhoven (NL)

(72)	Inventors:
	GURER, Emir Scotts Valley, CA 95066 (US) LEE, Ed, C. Cupertino, CA 95014 (US) KRISHNA, Murthy Sunnyvale, CA 94086 (US) REYNOLDS, Reese Los Gatos, CA 95032 (US) SALOIS, John Redwood City, CA 94064 (US) CHERRY, Royal San Jose, CA 95126 (US)

(74)	Representative: Van den Hooven, Jan et al
	ASML Netherlands B.V. Corporate Intellectual Property P.O. Box 324 5500 AH Veldhoven 5500 AH Veldhoven (NL)

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References cited: :

EP-A- 0 110 558
US-A- 4 938 994

EP-A- 0 829 767
US-A- 5 374 312

PATENT ABSTRACTS OF JAPAN vol. 007, no. 051 (P-179), 26 February 1983 (1983-02-26) & JP 57 198457 A (NIPPON DENKI KK), 6 December 1982 (1982-12-06)
PATENT ABSTRACTS OF JAPAN vol. 008, no. 092 (P-271), 27 April 1984 (1984-04-27) & JP 59 007949 A (NIPPON DENKI KK), 17 January 1984 (1984-01-17)
PATENT ABSTRACTS OF JAPAN vol. 018, no. 266 (E-1551), 20 May 1994 (1994-05-20) & JP 06 045244 A (MITSUMI ELECTRIC CO LTD), 18 February 1994 (1994-02-18)
PATENT ABSTRACTS OF JAPAN vol. 1996, no. 10, 31 October 1996 (1996-10-31) & JP 08 142534 A (KONICA CORP), 4 June 1996 (1996-06-04)
PATENT ABSTRACTS OF JAPAN vol. 007, no. 218 (E-200), 28 September 1983 (1983-09-28) & JP 58 111318 A (HITACHI SEISAKUSHO KK), 2 July 1983 (1983-07-02)
PATENT ABSTRACTS OF JAPAN vol. 1997, no. 02, 28 February 1997 (1997-02-28) & JP 08 272083 A (KONICA CORP), 18 October 1996 (1996-10-18)
PATENT ABSTRACTS OF JAPAN vol. 1996, no. 02, 29 February 1996 (1996-02-29) & JP 07 282476 A (SONY CORP), 27 October 1995 (1995-10-27)

Note: Within nine months from the publication of the mention of the grant of the European patent, any person may give notice to the European Patent Office of opposition to the European patent granted. Notice of opposition shall be filed in a written reasoned statement. It shall not be deemed to have been filed until the opposition fee has been paid. (Art. 99(1) European Patent Convention).