<?xml version="1.0" encoding="UTF-8"?>
<!DOCTYPE ep-patent-document PUBLIC "-//EPO//EP PATENT DOCUMENT 1.0//EN" "ep-patent-document-v1-0.dtd">
<ep-patent-document id="EP01301669B8W1" file="01301669.xml" lang="en" country="EP" doc-number="1127857" kind="B8" correction-code="W1" date-publ="20060503" status="c" dtd-version="ep-patent-document-v1-0">
<SDOBI lang="en"><B000><eptags><B001EP>..BE..DE....FRGB........NLSE....................................................</B001EP><B005EP>J</B005EP><B007EP>DIM360 (Ver 1.5  21 Nov 2005) -  2999001/0</B007EP></eptags></B000><B100><B110>1127857</B110><B120><B121>CORRECTED EUROPEAN PATENT SPECIFICATION</B121></B120><B130>B8</B130><B132EP>B1</B132EP><B140><date>20060503</date></B140><B150><B151>W1</B151><B152><date>00000000</date></B152><B153>84</B153><B155><B1551>de</B1551><B1552>Bibliographie</B1552><B1551>en</B1551><B1552>Bibliography</B1552><B1551>fr</B1551><B1552>Bibliographie</B1552></B155></B150><B190>EP</B190></B100><B200><B210>01301669.6</B210><B220><date>20010223</date></B220><B240><B241><date>20011207</date></B241><B242><date>20040202</date></B242></B240><B250>en</B250><B251EP>en</B251EP><B260>en</B260></B200><B300><B310>2000045657</B310><B320><date>20000223</date></B320><B330><ctry>JP</ctry></B330></B300><B400><B405><date>20060503</date><bnum>200618</bnum></B405><B430><date>20010829</date><bnum>200135</bnum></B430><B450><date>20051109</date><bnum>200545</bnum></B450><B452EP><date>20050525</date></B452EP><B480><date>20060503</date><bnum>200618</bnum></B480></B400><B500><B510EP><classification-ipcr sequence="1"><text>C03C   3/06        19680901AFI20010912BHEP        </text></classification-ipcr><classification-ipcr sequence="2"><text>C03B  19/14        19900101ALI20010912BHEP        </text></classification-ipcr><classification-ipcr sequence="3"><text>C03C   4/00        19850101ALI20010912BHEP        </text></classification-ipcr></B510EP><B540><B541>de</B541><B542>Fluorhaltiges Quarzglas und Verfahren zu seiner Herstellung</B542><B541>en</B541><B542>Fluorine-containing synthetic quartz glass and method of production</B542><B541>fr</B541><B542>Verre de quartz synthétique comprenant du fluor et sa méthode de production</B542></B540><B560><B561><text>EP-A- 0 691 312</text></B561><B561><text>EP-A- 1 035 084</text></B561><B561><text>EP-A- 1 043 282</text></B561><B561><text>EP-A- 1 094 040</text></B561><B561><text>EP-A- 1 103 528</text></B561><B561><text>WO-A-00/55689</text></B561><B561><text>US-A- 5 326 729</text></B561><B562><text>PATENT ABSTRACTS OF JAPAN vol. 1996, no. 4, 30 April 1996 (1996-04-30) &amp; JP 07 330366 A (SUMITOMO METAL IND LTD), 19 December 1995 (1995-12-19)</text></B562><B562><text>PATENT ABSTRACTS OF JAPAN vol. 9, no. 222, 9 September 1985 (1985-09-09) &amp; JP 60 086039 A (SUMITOMO ELECTRIC IND CO LTD ET AL), 15 May 1985 (1985-05-15)</text></B562><B562><text>PATENT ABSTRACTS OF JAPAN vol. 9, no. 222, 9 September 1985 (1985-09-09) &amp; JP 60 086044 A (SUMITOMO ELECTRIC IND CO LTD ET AL), 15 May 1985 (1985-05-15)</text></B562><B562><text>PATENT ABSTRACTS OF JAPAN vol. 1998, no. 8, 30 June 1998 (1998-06-30) -&amp; JP 10 067521 A (NIKON CORP), 10 March 1998 (1998-03-10)</text></B562><B562><text>PATENT ABSTRACTS OF JAPAN vol. 1999, no. 9, 30 July 1999 (1999-07-30) &amp; JP 11 116248 A (NIKON CORP), 27 April 1999 (1999-04-27)</text></B562></B560><B590><B598>2</B598></B590></B500><B700><B720><B721><snm>Maida, Shigeru,
c/o Advan. Func. Mat. Res. Ctr</snm><adr><str>Shin-Etsu Chem. Co., Ltd,
28-1 Oaza Nishifukushima</str><city>Kubiki-mura,
Nakakubiki-gun,
Niigata-ken</city><ctry>JP</ctry></adr></B721><B721><snm>Yamada, Motoyuki,
c/o Advan. Func. Mat. Res. Ctr</snm><adr><str>Shin-Etsu Chem. Co., Ltd,
28-1 Oaza Nishifukushima</str><city>Kubiki-mura,
Nakakubiki-gun,
Niigata-ken</city><ctry>JP</ctry></adr></B721><B721><snm>Otsuka, Hisatoshi,
c/o Advan. Func. Mat. Res. Ctr</snm><adr><str>Shin-Etsu Chem. Co., Ltd,
28-1 Oaza Nishifukushima</str><city>Kubiki-mura,
Nakakubiki-gun,
Niigata-ken</city><ctry>JP</ctry></adr></B721><B721><snm>Shirota, Kazuo,
c/o Advan. Func. Mat. Res. Ctr</snm><adr><str>Shin-Etsu Chem. Co., Ltd,
28-1 Oaza Nishifukushima</str><city>Kubiki-mura,
Nakakubiki-gun,
Niigata-ken</city><ctry>JP</ctry></adr></B721><B721><snm>Matsuo, Koji,
c/o Advan. Func. Mat. Res. Ctr</snm><adr><str>Shin-Etsu Chem. Co., Ltd,
28-1 Oaza Nishifukushima</str><city>Kubiki-mura,
Nakakubiki-gun,
Niigata-ken</city><ctry>JP</ctry></adr></B721></B720><B730><B731><snm>Shin-Etsu Chemical Co., Ltd.</snm><iid>00235614</iid><irf>GPS/FP5917026</irf><adr><str>6-1, Otemachi 2-chome</str><city>Chiyoda-ku,
Tokyo</city><ctry>JP</ctry></adr></B731></B730><B740><B741><snm>Stoner, Gerard Patrick</snm><sfx>et al</sfx><iid>00059901</iid><adr><str>Mewburn Ellis LLP 
York House 
23 Kingsway</str><city>London WC2B 6HP</city><ctry>GB</ctry></adr></B741></B740></B700><B800><B840><ctry>BE</ctry><ctry>DE</ctry><ctry>FR</ctry><ctry>GB</ctry><ctry>NL</ctry><ctry>SE</ctry></B840><B880><date>20011031</date><bnum>200144</bnum></B880></B800></SDOBI>
</ep-patent-document>
