(57) A chemically amplified positive resist composition excellent in adhesion to a substrate,
as well as good in dry-etching resistance;
suitable for use in excimer laser lithography utilizing ArF, KrF or the like; and
comprising
a resin (X) which, per se, is insoluble in alkali but becomes soluble in alkali
when subjected to an action of acid, and has a polymeric unit represented by the formula(I),
a polymeric unit represented by the formula(II) and a polymeric unit represented by
the formula(III): wherein R1 and R3 each independently represent hydrogen or methyl, R2 represents alkyl, R4 represents hydrogen or hydroxyl, and R5 and R6 each independently represent hydrogen, alkyl having 1 to 3 carbon atoms, hydroxyalkyl
having 1 to 3 carbon atoms, carboxyl, cyano or a group represented by -COOR7, wherein R7 represents an alcohol residue, or R5 and R6 together form a carboxylic acid anhydride residue represented by -C(=O)OC(=O)-, and
a polymeric unit derived from unsaturated dicarboxylic acid anhydride selected from
maleic anhydride and itaconic anhydride; and
an acid generating agent (Y).
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