SALICIDE PROCESS FOR MOSFET INTEGRATED CIRCUIT - Patent 1129477

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EP 1 129 477 A1

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(43)	Date of publication:
	05.09.2001 Bulletin 2001/36

(21)	Application number: 00956383.4

(22)	Date of filing: 02.08.2000

(51)	International Patent Classification (IPC)⁷: H01L 21/28, H01L 21/8238

(86)	International application number:
	PCT/EP0007/519

(87)	International publication number:
	WO 0111/669 (15.02.2001 Gazette 2001/07)

(84)	Designated Contracting States:
	AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE
	Designated Extension States:
	AL LT LV MK RO SI

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Priority:

09.08.1999 FR 9910309

(71)	Applicants:
	Koninklijke Philips Electronics N.V. 5621 BA Eindhoven (NL) STMicroelectronics S.A. 94250 Gentilly (FR) FRANCE TELECOM 75015 Paris (FR)

(72)	Inventors:
	DE COSTER, Walter, J., A. NL-5656 AA Eindhoven (NL) GERRITSEN, Eric NL-5656 AA Eindhoven (NL) BASSO, Marie-Therese NL-5656 AA Eindhoven (NL)

(74)	Representative: Duijvestijn, Adrianus Johannes
	Internationaal Octrooibureau B.V.,Prof. Holstlaan 6 5656 AA Eindhoven 5656 AA Eindhoven (NL)

(54)	SALICIDE PROCESS FOR MOSFET INTEGRATED CIRCUIT