NICKEL CARBONYL VAPOUR DEPOSITION APPARATUS AND PROCESS - Patent 1131475

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EP 1 131 475 A1

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(43)	Date of publication:
	12.09.2001 Bulletin 2001/37

(21)	Application number: 98952462.4

(22)	Date of filing: 03.11.1998

(51)	International Patent Classification (IPC)⁷: C23C 16/16, C23C 16/44, C22B 23/06, B01D 53/00, B01D 7/02

(86)	International application number:
	PCT/CA9801/023

(87)	International publication number:
	WO 0026/432 (11.05.2000 Gazette 2000/19)

(84)	Designated Contracting States:
	CH DE ES FR GB IT LI NL SE

(71)	Applicant: Chemical Vapour Deposition Systems Inc.
	Toronto,Ontario M5S 2B1 (CA)

(72)	Inventors:
	MILINKOVIC, Miroslav Toronto, Ontario M9A 3Y2 (CA) REYNOLDS, Rodney, P. Bolton, Ontario L7E 1T2 (CA) TEREKHOV, Dmitri, S. Newmarket, Ontario L3Y 5H5 (CA)

(74)	Representative: Denmark, James
	Bailey, Walsh & Co.5 York Place Leeds LS1 2SDYorkshire Leeds LS1 2SDYorkshire (GB)

(54)	NICKEL CARBONYL VAPOUR DEPOSITION APPARATUS AND PROCESS