SILANE-BASED OXIDE ANTI-REFLECTIVE COATING FOR PATTERNING OF METAL FEATURES IN SEMICONDUCTOR MANUFACTURING - Patent 1133788

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EP 1 133 788 A1

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(43)	Date of publication:
	19.09.2001 Bulletin 2001/38

(21)	Application number: 99930795.2

(22)	Date of filing: 28.06.1999

(51)	International Patent Classification (IPC)⁷: H01L 21/027, G03F 7/09

(86)	International application number:
	PCT/US9914/599

(87)	International publication number:
	WO 0031/782 (02.06.2000 Gazette 2000/22)

(84)	Designated Contracting States:
	DE FR GB

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Priority:

25.11.1998 US 199936

(71)	Applicant: ADVANCED MICRO DEVICES INC.
	Sunnyvale,California 94088-3453 (US)

(72)	Inventors:
	SUN, Sey-Ping Austin, TX 78739 (US) VAN NGO, Minh Fremont, CA 94538 (US)

(74)	Representative: Picker, Madeline Margaret
	Brookes Batchellor1 Boyne Park Tunbridge WellsKent TN4 8EL Tunbridge WellsKent TN4 8EL (GB)

(54)	SILANE-BASED OXIDE ANTI-REFLECTIVE COATING FOR PATTERNING OF METAL FEATURES IN SEMICONDUCTOR MANUFACTURING