(19)
(11) EP 1 135 789 A2

(12)

(88) Date of publication A3:
05.07.2001

(43) Date of publication:
26.09.2001 Bulletin 2001/39

(21) Application number: 00929001.6

(22) Date of filing: 03.05.2000
(51) International Patent Classification (IPC)7: H01J 37/317
(86) International application number:
PCT/US0040/082
(87) International publication number:
WO 0067/291 (09.11.2000 Gazette 2000/45)
(84) Designated Contracting States:
AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE
Designated Extension States:
AL LT LV MK RO SI

(30) Priority: 03.05.1999 US 304505

(71) Applicant: Etec Systems, Inc.
Hayward, CA 94545 (US)

(72) Inventors:
  • LEE, Kim, Y.
    Fremont, CA 94538 (US)
  • KIM, Ho-Seob
    Pupyeng-gu,Inchon (KR)
  • MANKOS, Marian
    San Francisco, CA 94115 (US)
  • MURAY, Lawrence
    Moraga, CA 94556 (US)
  • CHANG, T., H., P.
    Malpitas, CA 94404 (US)

(74) Representative: W.P. THOMPSON & CO. 
Celcon House289-293 High Holborn
London WC1V 7HU
London WC1V 7HU (GB)

   


(54) MICROFABRICATED TEMPLATE FOR MULTIPLE CHARGED PARTICLE BEAM CALIBRATIONS AND SHIELDED CHARGED PARTICLE BEAM LITHOGRAPHY