(19)
(11) EP 1 136 587 A3

(12) EUROPEAN PATENT APPLICATION

(88) Date of publication A3:
06.03.2002 Bulletin 2002/10

(43) Date of publication A2:
26.09.2001 Bulletin 2001/39

(21) Application number: 01106178.5

(22) Date of filing: 13.03.2001
(51) International Patent Classification (IPC)7: C23C 14/50, C23C 14/16, C23C 14/22, H01F 1/00
(84) Designated Contracting States:
AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR
Designated Extension States:
AL LT LV MK RO SI

(30) Priority: 23.03.2000 JP 2000081142

(71) Applicant: SUMITOMO SPECIAL METALS CO., LTD.
Osaka-shi Osaka (JP)

(72) Inventors:
  • Nishiuchi, Takeshi
    Ibaraki-shi, Osaka (JP)
  • Shimamoto, Ikuo
    Yabu-gun, Hyogo (JP)
  • Kikui, Fumiaki
    Minamikawachi-gun, Osaka (JP)
  • Tochishita, Yoshimi
    Yabu-gun, Hyogo (JP)
  • Sato, Kazumitsu
    Yabu-gun, Hyogo (JP)

(74) Representative: Körfer, Thomas, Dipl.-Phys. et al
Mitscherlich & Partner, Patent- und Rechtsanwälte, Sonnenstrasse 33
80331 München
80331 München (DE)

   


(54) Deposited-film forming apparatus


(57) With the deposited-film forming apparatus according to the first embodiment of the present invention, the distance between the tubular barrel and the evaporating section can be varied, unlike the prior art deposited-film forming apparatus and hence, the efficient formation of the deposited film on the surface of each of the work pieces accommodated in the tubular barrel and the inhibition of the softening of the formed film can be achieved simultaneously. Therefore, it is possible to inhibit the damaging of the deposited film formed on the surface of each of the work pieces and the production of projections on the deposited film, and to form a deposited film at a high quality in respect of a corrosion resistance and the like and at low cost.
With the deposited-film forming apparatus according to the second embodiment of the present invention, the distance between the accommodating section defined in the tubular barrel and the evaporating section can be varied and hence, this deposited- film forming apparatus also exhibits an effect similar to that in the deposited-film forming apparatus according to the first embodiment of the present invention.






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