PHYSICAL VAPOR DEPOSITION OF SEMICONDUCTING AND INSULATING MATERIALS - Patent 1141997

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EP 1 141 997 A2

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(88)	Date of publication A3:
	14.09.2000

(43)	Date of publication:
	10.10.2001 Bulletin 2001/41

(21)	Application number: 99968156.2

(22)	Date of filing: 20.12.1999

(51)	International Patent Classification (IPC)⁷: H01J 37/32

(86)	International application number:
	PCT/US9930/476

(87)	International publication number:
	WO 0038/213 (29.06.2000 Gazette 2000/26)

(84)	Designated Contracting States:
	AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE

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Priority:

21.12.1998 US 219187

(71)	Applicant: Applied Materials, Inc.
	Santa Clara,California 95052 (US)

(72)	Inventors:
	SIVARAMAKRISHNAN, Visweswaren Santa Clara, CA 95051 (US) LIM, Vicente Newark, CA 94560 (US) SINGH, Kaushal, K. Santa Clara, CA 95051 (US)

(74)	Representative: Clayton-Hathway, Anthony et al
	Fry, Heath & SpenceThe Old College53 High Street GB-Horley, Surrey RH6 7BN GB-Horley, Surrey RH6 7BN (GB)

(54)	PHYSICAL VAPOR DEPOSITION OF SEMICONDUCTING AND INSULATING MATERIALS