ELECTRON BEAM PHYSICAL VAPOR DEPOSITION APPARATUS AND CONTROL PANEL THEREFOR - Patent 1144710

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EP 1 144 710 A2

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(43)	Date of publication:
	17.10.2001 Bulletin 2001/42

(21)	Application number: 00975181.9

(22)	Date of filing: 03.08.2000

(51)	International Patent Classification (IPC)⁷: C23C 14/00

(86)	International application number:
	PCT/US0021/131

(87)	International publication number:
	WO 0111/103 (15.02.2001 Gazette 2001/07)

(84)	Designated Contracting States:
	AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE
	Designated Extension States:
	AL LT LV MK RO SI

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Priority:

04.08.1999 US 147229 P
24.07.2000 US 621754

(71)	Applicant: GENERAL ELECTRIC COMPANY
	Schenectady, NY 12345 (US)

(72)	Inventors:
	BRUCE, Robert, William Loveland, OH 45140 (US) EVANS, John, Douglas, Sr. Springfield, OH 45502 (US) MARICOCCHI, Antonio, Frank Loveland, OH 45140 (US)

(74)	Representative: Pedder, James Cuthbert
	GE London Patent Operation,Essex House,12/13 Essex Street London WC2R 3AA London WC2R 3AA (GB)


	Remarks:
	WIPO A3 publication data is not currently available.

(54)	ELECTRON BEAM PHYSICAL VAPOR DEPOSITION APPARATUS AND CONTROL PANEL THEREFOR