(19)
(11) EP 1 144 710 A3

(12)

(88) Date of publication A3:
16.08.2001

(43) Date of publication A2:
17.10.2001 Bulletin 2001/42

(21) Application number: 00975181.9

(22) Date of filing: 03.08.2000
(51) International Patent Classification (IPC)7C23C 14/30
(86) International application number:
PCT/US0021/131
(87) International publication number:
WO 0111/103 (15.02.2001 Gazette 2001/07)
(84) Designated Contracting States:
AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE

(30) Priority: 04.08.1999 US 147229 P
24.07.2000 US 621754

(71) Applicant: GENERAL ELECTRIC COMPANY
Schenectady, NY 12345 (US)

(72) Inventors:
  • BRUCE, Robert, William
    Loveland, OH 45140 (US)
  • EVANS, John, Douglas, Sr.
    Springfield, OH 45502 (US)
  • MARICOCCHI, Antonio, Frank
    Loveland, OH 45140 (US)

(74) Representative: Pedder, James Cuthbert 
GE London Patent Operation,Essex House,12/13 Essex Street
London WC2R 3AA
London WC2R 3AA (GB)

 
Remarks:
WIPO A3 publication data is not currently available.
 


(54) ELECTRON BEAM PHYSICAL VAPOR DEPOSITION APPARATUS AND CONTROL PANEL THEREFOR