(19)
(11) EP 1 145 287 A1

(12)

(43) Date of publication:
17.10.2001 Bulletin 2001/42

(21) Application number: 00964988.0

(22) Date of filing: 13.09.2000
(51) International Patent Classification (IPC)7: H01L 21/00
(86) International application number:
PCT/US0025/099
(87) International publication number:
WO 0131/691 (03.05.2001 Gazette 2001/18)
(84) Designated Contracting States:
AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE
Designated Extension States:
AL LT LV MK RO SI

(30) Priority: 28.10.1999 US 430353

(71) Applicants:
  • Philips Semiconductors Inc.
    Sunnyvale, CA (US)

    MC 
  • Koninklijke Philips Electronics N.V.
    5621 BA Eindhoven (NL)

    BE CH DE DK ES FI FR GB GR IE IT LI LU NL PT SE AT CY 

(72) Inventors:
  • WELING, Milind, Ganesh
    San Jose, CA 95131 (US)
  • ZHANG, Liming
    Sunnyvale, CA 94087 (US)

(74) Representative: Smeets, Eugenius Theodorus J. M. 
INTERNATIONAAL OCTROOIBUREAU B.V.,Prof. Holstlaan 6
5656 AA Eindhoven
5656 AA Eindhoven (NL)

   


(54) METHOD AND APPARATUS FOR CLEANING A SEMICONDUCTOR WAFER