(19)
(11) EP 1 147 546 A1

(12)

(43) Date of publication:
24.10.2001 Bulletin 2001/43

(21) Application number: 99957571.5

(22) Date of filing: 17.11.1999
(51) International Patent Classification (IPC)7: H01L 21/00, H01L 21/461, H01L 21/4763, B24B 1/00, B24B 7/24, B24B 7/00
(86) International application number:
PCT/US9927/225
(87) International publication number:
WO 0030/159 (25.05.2000 Gazette 2000/21)
(84) Designated Contracting States:
AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE

(30) Priority: 18.11.1998 US 108936 P

(71) Applicant: Rodel Holdings, Inc.
Wilmington, DE 19899 (US)

(72) Inventors:
  • PIERCE, Keith, G.
    Colorado Springs, CO 80906 (US)
  • LANGLOIS, Elizabeth, A.
    Newark, DE 19711 (US)
  • GETTMAN, David
    Bear, DE 19701 (US)
  • SACHAN, Vikas
    Hockessin, DE 19707 (US)
  • BURKE, Peter, A.
    Avondale, PA 19311 (US)

(74) Representative: Jones, Alan John et al
CARPMAELS & RANSFORD43 Bloomsbury Square
London, WC1A 2RA
London, WC1A 2RA (GB)

   


(54) METHOD TO DECREASE DISHING RATE DURING CMP IN METAL SEMICONDUCTOR STRUCTURES