(19)
(11) EP 1 166 341 A1

(12)

(43) Date of publication:
02.01.2002 Bulletin 2002/01

(21) Application number: 00914290.2

(22) Date of filing: 30.03.2000
(51) International Patent Classification (IPC)7H01L 21/311, G02B 6/12
(86) International application number:
PCT/GB0001/231
(87) International publication number:
WO 0059/020 (05.10.2000 Gazette 2000/40)
(84) Designated Contracting States:
AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE
Designated Extension States:
AL LT LV MK RO SI

(30) Priority: 31.03.1999 GB 9907302

(71) Applicant: THE UNIVERSITY COURT OF THE UNIVERSITY OF GLASGOW
Glasgow G12 8QQ (GB)

(72) Inventors:
  • Ruana-Lopez, Jesus, Miguel
    Glasgow G3 8PE (GB)
  • Bonar, James Ronald
    Paisley PA2 6JA (GB)
  • McLaughlin, Andrew James
    Cambuslang,Glasgow G72 7GQ (GB)
  • Da Silva Marques, Paulo Vicente
    P-4050 Porto (PT)
  • Jubber, Michael George
    Edinburgh EH10 4HX (GB)
  • Wilkinson, Christopher D. W.,The Unv. CourtUnv.
    GlasgowG12 8QQ (GB)
  • Aitchison, James Stewart
    Glasgow G12 9DN (GB)

(74) Representative: Naismith, Robert Stewart et al
CRUIKSHANK & FAIRWEATHER 19 Royal Exchange Square
Glasgow, G1 3AE Scotland
Glasgow, G1 3AE Scotland (GB)

   


(54) A REACTIVE ION ETCHING PROCESS