UTILIZATION OF SIH4, SOAK AND PURGE IN DEPOSITION PROCESSES - Patent 1185723

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EP 1 185 723 A1

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(43)	Date of publication:
	13.03.2002 Bulletin 2002/11

(21)	Application number: 00936088.4

(22)	Date of filing: 19.05.2000

(51)	International Patent Classification (IPC)⁷: C23C 16/42, H01L 21/285, H01L 21/3205, C23C 16/56

(86)	International application number:
	PCT/US0013/785

(87)	International publication number:
	WO 0070/121 (23.11.2000 Gazette 2000/47)

(84)	Designated Contracting States:
	AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE

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Priority:

19.05.1999 US 314999

(71)	Applicant: Applied Materials, Inc.
	Santa Clara,California 95054 (US)

(72)	Inventors:
	LITTAU, Karl Palo Alto, CA 94306 (US) TSENG, Jennifer, Meng Chu Saratoga, CA 95070 (US) CHANG, Mei Saratoga, CA 95070 (US) SRINIVAS, Ramanujapuram, A. San Jose, CA 95120 (US)

(74)	Representative: Bayliss, Geoffrey Cyril et al
	BOULT WADE TENNANT,Verulam Gardens70 Gray's Inn Road London WC1X 8BT London WC1X 8BT (GB)

(54)	UTILIZATION OF SIH4, SOAK AND PURGE IN DEPOSITION PROCESSES