(19)
(11) EP 1 192 648 A2

(12)

(88) Date of publication A3:
07.09.2001

(43) Date of publication:
03.04.2002 Bulletin 2002/14

(21) Application number: 00939756.3

(22) Date of filing: 09.06.2000
(51) International Patent Classification (IPC)7: H01L 21/316, H01L 29/78, H01L 27/115
(86) International application number:
PCT/US0015/956
(87) International publication number:
WO 0077/832 (21.12.2000 Gazette 2000/51)
(84) Designated Contracting States:
AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE
Designated Extension States:
AL LT LV MK RO SI

(30) Priority: 10.06.1999 US 329670
02.08.1999 US 365628

(71) Applicants:
  • SYMETRIX CORPORATION
    Colorado Springs, CO 80918 (US)
  • MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
    Kadoma-shi,Osaka 571-8501 (JP)

(72) Inventors:
  • HAYASHI, Shinichiro
    Osaka 569-1041 (JP)
  • JOSHI, Vikram
    Colorado Springs, CO 80919 (US)
  • SOLAYAPPAN, Narayan
    Colorado Springs, CO 80919 (US)
  • CUCHIARO, Joseph, D.
    Colorado Springs, CO 80919 (US)
  • PAZ DE ARAUJO, Carlos, A.
    Colorado Springs, CO 80919 (US)

(74) Representative: Schoppe, Fritz, Dipl.-Ing. 
Patentanwälte Schoppe, Zimmermann, Stöckeler & Zinkler,Postfach 71 08 67
81458 München
81458 München (DE)

   


(54) METAL OXIDE THIN FILMS FOR HIGH DIELECTRIC CONSTANT APPLICATIONS