BACKGROUND OF THE INVENTION
[0001] The present invention relates to a method for preparing a lithographic printing plate.
[0002] A negative-working presensitized plate useful for making a lithographic printing
plate is generally prepared by coating a photosensitive composition on a substrate
such as an aluminum plate, irradiating the composition with active light such as an
ultraviolet ray through a negative image to polymerize or cross-link the photosensitive
composition at the irradiated portion of the composition so that it becomes insoluble
to a developer, and dissolving the non-irradiated portion of the composition into
the developer to make an image area which receives oil ink and repels water and a
non-image area which receives water and repels oil ink. As the photosensitive composition
described above, a composition comprising a diazo resin such as a condensate of p-diazodiphenylamine
and formaldehyde has been widely utilized. Examples of an aqueous alkaline developer
for developing the presensitized plate with such a photosensitive composition comprising
a diazo resin include a developer composition comprising benzyl alcohol, an anionic
surfactant, an alkaline agent and water disclosed in J.P. KOKAI No. Sho 51-77401,
a developer composition comprised of an aqueous solution comprising benzyl alcohol,
an anionic surfactant and a water-soluble sulfite disclosed in J.P. KOKAI No. Sho
53-44202, and a developer composition comprising an organic solvent of which solubility
to water at room temperature is 10% by weight or less, an alkaline agent and water.
In order to improve the develop ability of such developers (the develop ability is
defined as an area of a presensitized plate that can be developed with each 1 L developer),
it is effective to increase the concentration of the alkaline agent in the developer.
However, the photosensitive layer of the presensitized plate to be developed is easily
erosible to result in deterioration of the printing durability and sensitivity (capability
for image formation) of the plate. Also, there is a strong demand in the printing
industry for a decrease in the amount of waste generated from the developer, due to
the recent growth in concern about the environment.
SUMMARY OF THE INVENTION
[0003] Accordingly, the purpose of the present invention is to provide a method for preparing
a lithographic printing plate by which printing durability and sensitivity is not
deteriorated even if a developer having a high developability is used.
[0004] The inventor of the present invention found that the aforementioned problems can
be solved by a method for preparing a lithographic printing plate comprising; imagewise
exposing a negative-working presensitized plate useful for making a lithographic printing
plate having a specific photosensitive on a substrate and developing the imagewise
exposed plate with an aqueous alkaline developer comprising an alkanolamine in a specific
amount, and thus obtained the present invention.
[0005] The present invention provides a method for preparing a lithographic printing plate
comprising; imagewise exposing a negative-working presensitized plate useful for making
a lithographic printing plate having a photosensitive layer comprising (a) a diazo
resin and (b) an organic polymer compound on a substrate and developing the imagewise
exposed plate with an aqueous alkaline developer comprising at least one alkanolamine
in an amount of 200 mmol/L or more.
[0006] According to the preferred embodiment of the present invention, said (b) organic
polymer compound is a modified polyvinyl acetal resin having at least one acid group.
DESCRIPTION OF THE PREFERRED EMBODIMENTS
[0007] Hereinafter, concrete embodiments of the present invention will be described.
[0008] The method for preparing a lithographic printing plate comprising; imagewise exposing
a negative-working presensitized plate useful for making a lithographic printing plate
having a photosensitive layer comprising (a) a diazo resin and (b) an organic polymer
compound on a substrate and developing the imagewise exposed plate with an aqueous
alkaline developer comprising at least one alkanolamine in an amount of 200 mmol/L
or more.
[Aqueous alkaline developer]
[0009] The aqueous alkaline developer utilized in the method of the present invention essentially
comprises at least one alkanolamine and water. Examples of alkanolamine include the
compounds represented by the following general formula.

[0010] In the formula, R
1, R
2 and R
3 each independently represents -H, - C
2H
4OH, or -C
3H
6OH. However, R
1, R
2, and R
3 do not simultaneously represent -H. Preferred alkanolamine used in the present invention
is selected from the group consisting of monoehtanolamine, diethanolamine and triethanolamine
and most preferably, triethanolamine. In addition, a combination of two or more alkanolamines
may be used.
[0011] The total amount of alkanolamine in the aqueous alkaline developer utilized in the
present invention should be at least 200mmol/L. It is not preferable if the amount
is lower than 200mmol/L, since the plate can not be sufficiently developed. The present
invention is characterized by use of a photosensitive layer comprising an organic
polymer compound, preferably a modified polyvinyl acetal resin, which does not cause
deterioration in sensitivity and printing durability of the obtained lithographic
printing plate, even when a developer having such high develop ability is used. The
preferred amount of the alkanolamine compound in an aqueous alkaline developer ranges
from 200 to 1000 mmol/L.
[0012] The developer of the present invention may comprise, in addition to alkanolamine,
at least one alkaline agent selected from inorganic alkaline agents such as sodium
silicate, potassium silicate, potassium hydroxide, and sodium hydroxide, and organic
amines such as triethylamine and diisopropylamine, but within an amount range that
does not inhibit the effect of the present invention.
[0013] Further, it would be possible to improve the wetting property of the developer so
as to wet the photosensitive composition or to further improve the gradation property
by adding, in addition to the aforementioned essential components, an anionic surfactant
and amphoteric surfactant as disclosed in J. P. KOKAI No. Sho 50- 51324, at least
one of the nonionic surfactants, as disclosed in J. P. KOKAI Nos. Sho 59-75255 and
Sho 60-111246, or polyelectrolyte as disclosed in J.P. KOKAI Nos. Sho 55-95946 and
Sho 56-142528. Among these components, anionic surfactant is preferred.
[0014] Examples of anionic surfactants include salt of higher (C
8-22) alcohol sulfate (e.g., sodium salt of lauryl alcohol sulfate, sodium salt of octyl
alcohol sulfate, ammonium salt of lauryl alcohol sulfate (trade name "Teepol B-81",
available from Shell Chemical), second sodium alkyl sulfate and the like), salt of
fatty alcohol phosphate (e.g., sodium salt of cetyl alcohol phosphate), salt of alkylarylsulfonic
acid (e.g., sodium salt of dodecylbenzenesulfonic acid, sodium salt of isopropylnaphthalenesulfonic
acid, sodium salt of dinaphthalenedisulfonic acid and sodium salt of metanitrobenzenesulfonic
acid), sulfonic acid salt of alkylamide (e.g.,C
17H
33CON(CH
3)CH
2CH
2SO
3Na and the like), and sulfonic acid salt of dibasic fatty acid ester (e.g., sodium
sulfosuccinic acid dioctyl ester, sodium sulfosuccinic acid dihexyl ester). Among
the surfactants, sodium isopropylnaphthalenesulfonate (trade name "Aerosol OS", available
from American Cyanamide) is preferable since this compound is effective even in a
small amount when it is used in combination with benzyl alcohol.
[0015] The amount of the surfactant and polyelectrolyte to be added ranges preferably from
0.1 to 5% by weight and more preferably from 0.5 to 3 % by weight, but is not limited
thereto.
[0016] In addition, the developer of the present invention may comprise an aqueous sulfite,
if necessary. Preferred examples of such aqueous sulfite include alkali or alkaline
earth metal salt of sulfurous acid such as sodium sulfite, potassium sulfite, lithium
sulfite, magnesium sulfite and the like. The amount of the sulfite in the developer
composition may range from 0 to 4% by weight and preferably from 0 to 1% by weight.
[0017] Further, in place of the aqueous sulfite described above, an alkaline-soluble pyrazolone
compound, an alkaline-soluble thiol compound, or a hydroxyl aromatic compound such
as methylresorcin may be added to the developer. In addition, it would be possible
to use an aqueous sulfite compound with these above compounds. The developer used
in the invention may optionally comprise additives such as an antifoaming agent and
a water softener. A preferred example of the antifoaming agent includes a silicone-type
one. Examples of water softener include salts of polyphosphoric acid and polyaminocarboxylic
acids. The optimum amount of the water softener varies depending on the hardness and
the amount of the hard water to be used, but the amount thereof generally ranges from
0.01 to 5% by weight and preferably 0.01 to 0.5% by weight on the basis of the total
weight of the developer practically used.
[0018] The developer utilized in the present invention may comprise, if necessary, a specific
kind of organic solvent. A preferred organic solvent is capable of dissolving or swelling
a non-exposed area (non-imaging area) of the photosensitive layer when the plate is
immersed in the developer and has solubility of 10% by weight or below to water at
an ordinary temperature. Examples of such a solvent are described below, but not limited
thereto; carboxylate compounds (ester of carboxylic acid) such as ethyl acetate, butyl
acetate, benzyl acetate, ethylene glycol monobutyl acetate, butyl lactate and butyl
levulinate; ketone compounds such as methyl isobutyl ketone and cyclohexanone; alcohols
such as ethylene glycol monobutyl ether, ethylene glycol benzyl ether, ethylene glycol
monophenyl ether, benzyl alcohol, methyl phenyl carbinol, n-amyl alcohol and methylamyl
alcohol; alkyl-substituted aromatic hydrocarbons and halogenated hydrocarbons. A combination
of two or more solvents described above also can be used. Among the solvents, ethylene
glycol monophenyl ether and benzyl alcohol are especially useful. The amount of the
solvents in the developer may range approximately from 0 to 20% by weight. Especially,
preferable results can be obtained when the solvent is used in the amount ranging
from 2 to 10% by weight.
[0019] In addition, a certain solubilizer to aid dissolution of the aforementioned organic
solvent in water may be added to the developer. As such a solubilizer, it is preferable
to use alcohols or ketones having a lower molecular weight and higher water-solubility
than those of the organic solvent to be used. In addition, an anionic surfactant,
amphoteric surfactant and the like can be used. Preferred examples of the surfactant
include sodium isopropylnaphthalenesulfonate, sodium N-methyl-N-pentadecylaminoacetate,
and sodium lauryl sulfate.
[0020] However, the developer comprising any organic solvent may cause many problems (e.g.,
health problems such as toxicity and a bad odor occurring during work, safety problems
such as fire and gaseous explosion, workability problems such as generation of foam,
pollution problems such as waste water, cost and the like). Therefore, it is more
preferable that the developer substantially not be comprised of any organic solvent.
[0021] For example, the aqueous alkaline developer of the present invention may be those
comprising a specific amount of alkanolamine and, as a base composition, an aqueous
alkaline developer substantially comprising no organic solvent as described in J.P.
KOKAI Nos. Sho 59-84241, 57-192952 and 62-24263.
[Photosensitive layer]
[0022] The photosensitive layer used in the method of the present invention comprises a
photosensitive composition comprising (a) a diazo resin and (b) an organic polymer
compound. The photosensitive layer may comprise a photo-polymerizable composition
comprising a polymerizable compound having an ethylenically unsaturated bond, an initiator
of photopolymerization and a polymer compound, in addition to the (a) diazo resin
and (b) organic polymer compound.
(I) Organic polymer compound
[0023] The organic polymer compound (b) used in the photosensitive layer includes a modified
polyvinyl acetal resin comprising at least one acid group or a polyurethane resin
comprising at least one acid group, polyamide resin, epoxy resin, acrylic resin, methacrylic
resin, polystyrene resin or novolak-type phenol resin. Among these resins, modified
polyvinyl acetal resin comprising at least one acid group or a polyurethane resin
comprising at least one acid group is preferred since the printing durability and
sensitivity of the photosensitive layer comprised of such resin do not deteriorate.
Further, the modified polyvinyl acetal resin comprising one acid group is most preferred
because this resin provides not only a nondecreasing effect but also an increasing
effect on the sensitivity of the plate, which latter effect is an expected effect.
In the present invention, two or more of organic polymer compounds may be used. When
two or more compounds are used, it is preferred to use at lest one modified polyvinyl
acetal resin comprising at least one acid group as one of the compounds.
[0024] The aforementioned modified polyvinyl acetal resin comprising at least one acid group
will be explained below. The term "acid group" means a group comprising an acidic
hydrogen atom of which an acid dissociation constant (pKa) is 7 or less. For example,
-COOH, -SO
2NHCOO-, - CONHSO
2-, -CONHSO
2NH-, -NHCONHSO
2- and the like are included. In particular, preferred group is -COOH. The amount of
acid in 1 g polyurethane resin may be preferably in the range of 0.05 to 6 meq. If
the amount of acid is less than 0.05 meq, the photosensitive composition can not be
sufficiently developed with an aqueous alkaline developer. In contrast, if the amount
of acid is more than 6 meq, the abrasion resistance of the photosensitive composition
would be deteriorated. The more preferable amount of the acid is in the range from
0.2 to 4 meq.
[0025] The word "modified" utilized in the term modified polyvinyl acetal resin means to
give a resin a chemical structure and physical property different from that of the
original resin by conducting chemical modification at the alcohol portion of the polyvinyl
acetal resin.
[0026] Examples of such a modified polyvinyl acetal resin include polymers represented by
the following general formula, as disclosed in J.P. KOKAI Nos. Sho 61-267042, Sho
61-128123, Sho 62-58242, and Hei 5-165206.

[0027] In the formula, R
4 represents an optionally substituted alkyl group or hydrogen atom, R
5 represents an optionally substituted alkyl group, R
6 represents an aliphatic or aromatic hydrocarbon group having carboxylic acid, R
7 represents an aliphatic or aromatic hydrocarbon group having at least one hydroxyl
group or nitrile group and another optional group, and n1, n2, n3, n4, and n5 mean
mole % of each respective repeating unit and are in the range of :n1 = 5 ∼ 85, n2
= 0 ∼ 60, n3 = 0 ∼ 20, n4 = 3 ∼ 60, n5=0 ∼ 60.
[0028] In the above formula, R
4 is preferably an optionally substituted C
1∼8 alkyl group or hydrogen atom, R
5 is preferably a substituted or unsubstituted C
1∼4 alkyl group, R
6 is preferably a C
1∼8alkyl group having a carboxylic acid group or a phenyl or naphthyl group having a
carboxylic acid group, R
7 is preferably a C
1∼8 alkyl group or a phenyl or naphthyl group having at least one hydroxyl or nitrile
group and another optional group.
[0029] In the above definitions, substituents in the alkyl group may be at least one selected
from the group consisting of C
1∼8 alkyl group, C
1∼8 alkyloxy group, C
1∼8 alkylcarbonyl group, phenyl group, phenyloxy group, hydroxyl group, amino group and
halogens.
[0030] Also, polymers disclosed in J.P. KOKAI No. Sho 60-182437 or polymers having alkenylsulfonylurethane
as a side chain disclosed in J.P. KOKAI No. Sho 57-94747 may be preferably used as
the organic polymer compound for the photosensitive layer.
[0031] The weight-average molecular weight of the modified polyvinyl acetal resin comprising
at least one acid group is preferably not less than 10,000 and more preferably from
30,000 to 300,000. These resins may be used alone or in a combination. The amount
of the modified polyvinyl acetal resin in the photosensitive layer may be not less
than 50% by weight, more preferably from 50 to 99% by weight and still more preferably
from about 60 to 95% by weight.
[0032] Preferred polyurethane resin usable in the photosensitive layer of the present invention
is that comprising at least one acid group. The term "acid group" means a group comprising
an acidic hydrogen atom of which the acid dissociation constant (pKa) is 7 or less.
Such groups, for example, are -COOH, -SO
2NHCOO-, -CONHSO
2-, -CONHSO
2NH-, -NHCONHSO
2- and the like. In particular, a preferred group is -COOH. The amount of acid in 1
g polyurethane resin may be preferably in the range of 0.05 to 6 meq. If the amount
of acid is less than 0.05 meq, developability of the photosensitive composition with
an alkaline developer would be insufficient. In contrast, if the amount is more than
6 meq, abrasion resistance of the photosensitive composition would be deteriorated.
A more preferable amount of the acid ranges from 0.2 to 4 meq. Details of methods
for preparing the aforementioned polyurethane resins are described in J.P. KOKAI Nos.
Sho 63-113450 and Hei 5-165206.
[0033] The weight-average molecular weight of the polyurethane resin utilized in the present
invention is preferably not less than 10,000 and more preferably from 30,000 to 300,000.
The polyurethane resin may be used alone or in combination. The amount of the polyurethane
resin in the photosensitive layer may be 50% by weight or more, preferably from 50
to 99% by weight and more preferably from about 60 to 95% by weight.
(II) Diazo resin
[0034] Next, (a) diazo resin used in the photosensitive layer of the present invention will
be described. (a) Diazo resin suitable for use in the photosensitive layer may be
a reaction product of diazonium salt and organic condensation reagent comprising a
reactive carbonyl group such as aldol and acetal (so called photosensitive diazo resin),
e.g., a condensation product of diphenylamine-p-diazonium salt and formaldehyde, as
described in U.S. Patent Nos. 2,063,631 and 2,667,415. Also, other diazo compounds
described in J.P.KOKOKU Nos. Sho 49-48001, Sho 49-45322, and Sho 49-45323 are suitable
for use as the (a) diazo resin in the photosensitive layer. These diazo compounds
are usually obtained in the form of water-soluble inorganic salt. Therefore, the compounds
can be applied in the form of aqueous solution.
[0035] In addition, as described in J.P.KOKOKU No. Sho 47-41167, these water-soluble diazo
compounds can be further reacted with an aromatic or aliphatic compound having one
or more phenolic hydroxyl groups, sulfonic acid groups or both hydroxyl and sulfonic
acid groups. Thus obtained photosensitive diazo resin that is substantially insoluble
in water can also be used as the diazo resin in the photosensitive layer.
[0036] Further, it is possible to use a reaction product of a diazonium compound with a
hexafluorophosphate compound or tetrafluoroborate compound, as described in J.P. KOKAI
No. Sho 56-121031, as the diazo resin in the photosensitive layer.
[0037] Examples of the reaction product comprising a phenolic hydroxyl group include hydroxybenzophenone,
4,4-bis(4'-hydroxyphenyl)pentanoic acid, resorcinol, or diphenolic acid such as diresorcinol,
which may further comprise any substituent. Examples of hydroxybenzophenone include
2,4-dihydroxybenzophenone, 2-hydroxy-4-methoxybenzophenone, 2,2'-dihydroxy-4,4'-dimethoxybenzophenone
and 2,2',4,4'-tetrahydroxybenzophenone.
[0038] Examples of a preferable compound comprising a sulfonic acid group include aromatic
compounds, such as benzene, toluene, xylene, naphthaline, phenol, naphthol and benzophenone,
comprising sulfonic acid, or soluble salts thereof, e.g., ammonium salt and alkali
metal salt thereof. The compound comprising sulfonic acid group may further comprise
a substituent such as lower alkyl group, nitro group, halo group and/or an additional
sulfonic acid group.
[0039] Preferred compounds include benzenesulfonic acid, toluenesulfonic acid, naphthalinesulfonic
acid, 2,5-dimethylbenzenesulfonic acid, benzenesulfonic acid sodium salt, naphthaline-2-sulfonic
acid, 1-naphthol-2 (or 4)-sulfonic acid, 2,4-dinitro-1-naphthol-7-sulfonic acid, 2-hydroxy-4-methoxybenzophenone-5-sulfonic
acid, m-(p'-anilinophenylazo)benzenesulfonic acid, alizarin sulfonic acid, o-toluidine-m-sulfonic
acid, ethanesulfonic acid and the like. Sulfonic acid esters with alcohol or salts
thereof are also useful as the compound comprising sulfonic acid. Generally, such
compounds are easily obtainable as an anion surfactant. Examples of such compounds
include ammonium salt or alkali metal salt of lauryl sulfate, alkylaryl sulfate, p-nonylphenyl
sulfate, 2-phenylethyl sulfate, isooctylethoxydiethoxyethylsulfate and the like.
[0040] These substantially water-insoluble photosensitive diazo resins can be isolated as
a precipitate by admixing water-soluble photosensitive diazo resin and an aqueous
solution of said aromatic or aliphatic compound, preferably in the ratio of equivalence.
[0041] In addition, diazo resin described in U.K. Patent No. 1,312,925 is preferably used
in the present invention. Moreover, the following diazo resins are also preferably
used in the present invention: diazo resin comprising oxy acid of phosphor described
in J.P. KOKAI No. Hei 3-253857, diazo resin condensed with a carboxyl group-containing
aldehyde or acetal compound thereof described in J.P. KOKAI No. Hei 4-18559, and copolymerized
diazo resin with a carboxyl-containing aromatic compound such as phenoxyacetic acid
described in J.P.A. No. Hei 3-23031.
[0042] The most preferable diazo resin is 2-methoxy-4-hydroxy-5-benzoylbenzenesulfonic acid
salt of a condensation product of p-diazodiphenylamine and formaldehyde.
[0043] The amount of the diazo resin to be used usually ranges 5 to 50 % by weight based
on the total weight of the photosensitive layer. When the amount of diazo resin becomes
less, the stability of the resin will be decreased with time, although the sensitivity
of the photosensitive layer is consequently improved. The optimum amount of the diazo
resin is from about 8 to 20 % by weight.
[0044] Hereinafter, a photopolymerizable composition usable as a photosensitive composition
for the photosensitive layer of the present invention will be explained. The photopolymerizable
composition essentially comprises (a) a diazo resin and (b) an organic polymer compound
described above and further comprises a polymerizable compound having an ethylenically
unsaturated bond, an initiator of photopolymerization and a polymer compound.
[0045] The polymerizable compound having an ethylenically unsaturated bond means a compound
having at least one ethylenically unsaturated bond in its structure and being in the
form of a monomer, prepolymer (that is, dimer, trimer and other oligomer), mixture
thereof or copolymer thereof. Examples of such compounds include unsaturated carboxylic
acid, salts thereof, ester of unsaturated carboxylic acid and aliphatic polyalcohol,
amide of unsaturated carboxylic acid and aliphatic polyamine and the like.
[0046] Examples of the unsaturated carboxylic acid include acrylic acid, methacrylic acid,
itaconic acid, crotonic acid, isocrotonic acid, maleic acid and the like.
[0047] Examples of the salt of unsaturated carboxylic acid include alkali metal salt such
as sodium salt and potassium salt, of the aforementioned acid.
[0048] Examples of the ester of an aliphatic polyalcohol compound and unsaturated carboxylic
acid include acrylate ester, e.g., ethylene glycol diacrylate, triethylene glycol
diacrylate, 1,3-butanediol diacrylate, tetramethylene glycol diacrylate, propylene
glycol diacrylate, trimethylolpropane triacrylate, trimethylolethane triacrylate,
1,4-cyclohexanediol diacrylate, tetraethylene glycol diacrylate, pentaerythritol diacrylate,
pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol diacrylate,
dipentaerythritol triacrylate, dipentaerythritol tetraacrylate, dipentaerythritol
hexaacrylate, sorbitol triacrylate, sorbitol tetraacrylate, sorbitol pentaacrylate,
sorbitol hexaacrylate, polyester acrylate oligomer and the like.
[0049] Examples of the methacrylate ester include tetramethylene glycol dimethacrylate,
trimethylene glycol dimethacrylate, trimethylolpropane trimethacrylate, trimethylolethane
trimethacrylate, ethylene glycol dimethacrylate, 1,3-butanediol dimethacrylate, pentaerythritol
dimethacrylate, pentaerythritol trimethacrylate, dipentaerythritol dimethacrylate,
sorbitol trimethacrylate, sorbitol tetramethacrylate, bis-[p-(3-methacryloxy-2-hydroxypropoxy)phenyl]dimethylmethane,
bis[p-(methacryloxyethoxy)phenyl]dimethylmethane and the like.
[0050] Examples of the itaconate ester include ethylene glycol diitaconate, propylene glycol
diitaconate, 1,3-butanediol diitaconate, 1,4-butanediol diitaconate, tetramethylene
glycol diitaconate, pentaerythritol diitaconate, sorbitol tetraitaconate and the like.
[0051] Examples of crotonic acid ester include ethylene glycol dicrotonate, tetramethylene
glycol dicrotonate, pentaerythritol dicrotonate, sorbitol tetracrotonate and the like.
[0052] Examples of isocrotonic acid ester include ethylene glycol diisocrotonate, pentaerythritol
diisocrotonate, sorbitol tetraisocrotonate and the like.
[0053] Examples of maleate ester include ethylene glycol dimaleate, triethylene glycol dimaleate,
pentaerythritol dimaleate, sorbitol tetramaleate and the like.
[0054] Also, mixtures of the aforementioned esters may be included in the above examples.
[0055] Examples of amide compounds of aliphatic polyamine and unsaturated carboxylic acid
include methylenebis-acrylamide, methylenebismethacrylamide, 1,6-hexamethylenebis-acrylamide,
1,6-hexamethylenebismethacrylamide, diethylenetriaminetrisacrylamide, xylylenebisacrylamide,
xylylenebismethacrylamide and the like.
[0056] Other examples of the polymerizable compound include a vinyl urethane compound having
a molecule comprising two or more polymerizable vinyl groups, which can be prepared
by addition of a vinyl monomer comprising a hydroxyl group shown below (general formula
(XIII)) to a polyisocyanate compound having a molecule comprising at least two isocyanate
groups as described in J.P.KOKOKU No. Sho 48-41708.
CH
2=C(R)COOCH
2CH(R')OH (XIII)
(wherein, each R and R' represents a hydrogen atom or methyl group.)
[0057] Examples of the initiator of photopolymerization include a vicinal polyketaldonyl
compound disclosed in U.S. Patent No. 2,367,660, an α-carbonyl compounds disclosed
in U.S. Patent Nos. 2,367,661 and 2,367,670, an acyloin ether disclosed in U.S. Patent
No. 2,448,828, an aromatic acyloin compound having a hydrocarbon group at α-position
as disclosed in U.S. Patent No. 2,722,512, polynuclear quinone compounds disclosed
in U.S. Patent Nos. 3,046,127 and 2,951,758, a combination of triarylimidazole dimer/p-aminophenylketone
disclosed in U.S. Patent No. 3,549,367, benzothiazoles disclosed in U.S. Patent No.
3,870,524, benzothiazoles/trihalomethyl-s-triazines disclosed in U.S. Patent No. 4,239,850,
acridines and phenazines disclosed in U.S. Patent No. 3,751,259, and oxadiazoles disclosed
in U.S. Patent No. 4,212,970. The amount of the compound may range from about 0.5%
to about 15% by weight and preferably from 2% to 10% by weight based on the total
weight of the photopolymerizable composition.
[0058] Examples of polymer compounds usable in the present invention include a copolymer
of benzyl (meth)acrylate/(meth)acrylic acid/other optional addition-polymerizable
vinyl monomer as disclosed in J.P.KOKOKU No. Sho 59-44615; copolymer of methacrylic
acid/methyl methacrylate or methacrylic acid/alkyl methacrylate as disclosed in J.P.KOKOKU
No. Sho 54-34327, (meth)acrylic acid copolymer as disclosed in J.P.KOKOKU No. Sho
58-12577, J.P.KOKOKU No. Sho 54-25957, and J.P. KOKAI No. Sho 54-92723, copolymer
of allyl (meth)acrylate/(meth)acrylic acid/other optional addition-polymerizable vinyl
monomer as disclosed in J.P. KOKAI No. Sho 59-53836, addition products of maleic anhydride
copolymers and pentaerythritol triacrylates through half-esterification as disclosed
in J.P. KOKAI No. Sho 59-71048, and an acidic vinyl polymer with an acid value of
50 to 200 having a -COOH, -PO
3H
2, -SO
3H, -SO
2NH
2, - SO
2NHCO- group in a polymer such as a copolymer of vinyl methacrylate/methacrylic acid/other
optional addition-polymerizable vinyl monomer.
[0059] Among said polymers, a copolymer of benzyl (meth)acrylate/(meth)acrylic acid/other
optional addition-polymerizable vinyl monomer and a copolymer of allyl (meth)acrylate/(meth)acrylic
acid/other optional addition-polymerizable vinyl monomer are preferable. These polymer
compounds can be used alone or in a combination of two or more compounds. The molecular
weight of these polymer compounds may widely vary depending on the kind of compounds,
but generally, it is in the range of from 5,000 to 1,000,000 and preferably from 10,000
to 500,000. The amount of the polymer compound may range from 10% to 90% by weight
and preferably from 30% to 85% by weight based on the total weight of the photopolymerizable
composition.
[0060] In addition to the above components, it is preferred that the photosensitive layer
further comprises an inhibitor for heat polymerization. For example, hydroquinone,
p-methoxyphenol, di-t-butyl-p-cresol, pyrogallol, t-butylcatechol, benzoquinone, 4,4'-thiobis(3-methyl-6-t-butylphenol),
2,2'-methylenebis(4-methyl-6-t-butylphenol), 2-mercaptobenzimidazol and the like are
suitable for use as the inhibitor.
[0061] Moreover, in order to prevent inhibition of polymerization by oxygen in air, a wax
can be added to the photosensitive layer. Wax usable in the present invention is in
a solid form at an ordinary temperature but dissolves in a coating solution and precipitates
during coating and drying processes. Examples of such wax include higher fatty acid
such as stearic acid and behenic acid, higher fatty acid amide such as stearylamide
and behenylamide, higher alcohol and the like.
[0062] In order to completely protect the photosensitive layer from inhibition of polymerization
by oxygen in air, a protective layer comprising a polymer which is excellent in blocking
oxygen such as polyvinyl alcohol, acidic celluloses and the like may be formed on
the photosensitive layer. For example, a method for formation of such a protective
layer is described in U.S. Patent No. 3,458,311, and J.P.KOKOKU No. Sho 55-49729.
[0063] The photosensitive composition used in the present invention may comprise a colorant,
which is used for obtaining a visible image after the negative-working presensitized
plate is imagewise exposed to light and after the imagewise exposed plate is developed.
The preferable colorants are those providing a change of color tone through a reaction
with free radicals or acids. The phrase a "change of color tone" include the meaning
of a change of a colorless tone to colored tones, a change of a colored tone to a
colorless tone, and a change of a color tone to other color tones. Preferred colorants
may be those which form a salt with an acid to change their color.
[0064] Specific examples of a colorant which is initially colored and is converted into
a colorless tone, or which causes a color change include triphenylmethanes, diphenylamines,
oxazins, xanthenes, iminonaphthoquinones, azomethenes or anthraquinones dye such as
Victoria Pure Blue and naphthalenesulfonic acid salt thereof (available from Hodogaya
Chemical Co., Ltd.), Oil Blue #603 (available from Orient Chemical Industries, Co.,
Ltd.), Patent Pure Blue (available from Sumitomo Mikuni Chemical Co., Ltd.), Crystal
Violet, Brilliant Green, Methyl Violet, Ethyl Violet, Methyl Green, Erythrosine B,
Basic Fuchsine, Malachite Green, Oil Red, m-Cresol Purple, Rhodamine B, Auramine,
4-p-diethylaminophenyl iminonaphthoquinone, and cyano-p-diethylaminophenyl acetanilide,
[0065] Examples of a colorant which is initially colorless and is converted into a colored
tone include leuco dyes and primary or secondary arylamine type dyes such as triphenylamine,
diphenylamine, o-chloroaniline, 1,2,3-triphenylguanidine, naphthylamine, diaminodiphenylmethane,
p,p'-bis-dimethylaminodiphenylamine, 1,2-dianilinoethylene, p,p',p"-tris-dimethylaminotriphenylmethane,
p,p'-bis-dimethylaminodiphenylmethylimine, p,p',p"-triamino-o-methyltriphenylmethane,
p,p'-bis-dimethylaminodiphenyl-4-anilinonaphthylmethane and p,p',p"-triaminotriphenylmethane.
[0066] Especially preferred as such a colorant are triphenylmethane type dyes and diphenylmethane
type dyes, triphenylmethane type dyes being more preferable, and in particular Victoria
Pure Blue BOH and naphthalenesulfonic acid salt thereof. The foregoing dyes are used
in an amount preferably ranging from about 0.5 to 10% by weight, and more preferably,
about 1 to 5% by weight based on the total weight of the photosensitive composition.
[0067] The photosensitive composition used in the present invention may optionally comprise
other kinds of additives. For example, alkyl ethers (e.g., ethyl cellulose, methyl
cellulose), fluorinated surfactants, and nonionic surfactants (especially fluorinated
surfactants are preferred) for improving applicability of the composition, a plasticizer
for improving the flexibility and wear resistance of the resulting coating layer (e.g.,
butyl phthalyl, polyethylene glycol, tributyl citrate, diethyl phthalate, dibutyl
phthalate, dihexyl phthalate, dioctyl phthalate, tricresyl phosphate, tributyl phosphate,
trioctyl phosphate, tetrahydrofurfuryl oleate and oligomers and polymers of (meth)acrylic
acid, with tricresyl phosphate being particularly preferred), an agent for improving
the ink receptivity of images (e.g., styrene/maleic anhydride copolymers half-esterified
with alcohols, novolak resins such as p-t-butylphenol-formaldehyde resin and fatty
acid esters of p-hydroxystyrene as disclosed in J.P. KOKAI No. Sho 55-527), a stabilizing
agent (e.g., phosphoric acid, phosphorous acid, pyrophosphate, phenylphosphonic acid,
5-nitronaphthalene-1-phosphonic acid, 4-chlorophenoxymethylphosphonic acid, citric
acid, tartaric acid, oxalic acid, malic acid, propane-1,2,3-tricarboxylic acid, 2-phosphonobutane-1,2,4-tricarboxylic
acid, 1-phosphonoethane-1,2,2-tricarboxylic acid, dipicolinic acid, sulfosalicylic
acid, 3-sulfophthalic acid, 2-sulfoterephthalic acid, 5-sulfoisophthalic acid, boric
acid, p-toluenesulfonic acid, benzenesulfonic acid, p-hydroxybenzenesulfonic acid,
isopropylnaphthalenesulfonic acid, t-butylnaphthalenesulfonic acid, 4-methoxy-2-hydroxybenzophenone-5-sulfonic
acid, sodium phenyl-methyl-pyrazolonesulfonate, 1-hydroxyethane-1,1-disulfonic acid,
tricarballylic acid, polyacrylic acid and copolymers thereof, polyvinylphosphonic
acid and copolymers thereof and polyvinylsulfonic acid and copolymers thereof), and
an accelerating agent for the development of the presensitized plate (e.g., higher
alcohol, acid anhydride and the like) may be preferably used.
[0068] Although the amount of each additive to be used in the photosensitive composition
depends on the type of photosensitive composition and on the purpose for which the
presensitized plate is to be used, generally it ranges from 0.01 to 30% by weight
based on the total weight of the solid components. In order to coat the aforementioned
photosensitive composition on a substrate, an appropriate amount of the photosensitive
diazonium compound, lipophilic polymer compound and optional additives may be dissolved
in a suitable solvent (e.g., Methyl Cellosolve ®, Ethyl Cellosolve ®, dimethoxyethane,
diethylene glycol monomethyl ether, diethylene glycol dimethyl ether, 1-methoxy-2-propanol,
Methyl Cellosolve ® acetate, acetone, methyl ethyl ketone, methanol, dimethylformamide,
dimethylacetamide, cyclohexanone, dioxane, tetrahydrofuran, methyl lactate, ethyl
lactate, ethylene dichloride, dimethylsulfoxide, and water or mixtures thereof) to
prepare a coating solution of photosensitive composition and the solution may be applied
onto the substrate followed by drying.
[0069] The solvent may be used alone, but it is more preferred to use a mixture of a solvent
having a relatively high boiling point such as Methyl Cellosolve ®, 1-methoxy-2-propanol
and methyl lactate and a solvent having a relatively low boiling point such as methanol
and methyl ethyl ketone. The concentration of the solid components of the photosensitive
composition in the coating solution desirably ranges from 1 to 50% by weight. In such
a case, the coating amount of the photosensitive composition may be in the range of
0.2 to 10 g/m
2 (as dry weight), and preferably in the range of 0.5 to 3 g/m
2.
[0070] The aforementioned photosensitive composition may be coated on a suitable substrate
to prepare a presensitized plate useful for making a lithographic printing plate.
Examples of the suitable substrate include a paper, a paper laminated with a plastic
film (such as polyethylene, polypropylene and polystyrene film), a metal plate such
as aluminum (including aluminum-containing alloy), zinc and copper plate, a plastic
film such as cellulose diacetate, cellulose triacetate, cellulose propionate, polyethylene
terephthalate, polyethylene-polypropylene, polycarbonate, polyvinyl acetal and the
like, a paper or a plastic film laminated or deposited with the aforementioned metal
and a copper plate coated with aluminum or chromium. In particular, an aluminum plate
or a composite coated with aluminum is preferably used as a substrate.
[0071] The aluminum plate preferably used in the present invention has a thickness in the
range of 0.1 to 0.6 mm. In addition, one side or both sides of the presensitized plate
useful for making a lithographic printing plate utilized in the present invention
may be used, in the case where both sides are treated in the same way. Hereinafter,
a treatment of only one side of the plate will be described, but it will be understood
that both sides can be treated in a manner similar to that in which one side of the
plate is treated as described below to prepare a presensitized plate of which both
sides can be utilized.
[0072] The surface of the aluminum plate is desirably treated to improve water-holding capacity
and adherence to the photosensitive layer. Examples of surface-roughening methods
include brush graining, ball graining, electrolytic etching, chemical etching, liquid
honing, sand blast graining and a combination thereof. Preferred methods for surface
roughening are brush graining, electrolytic etching, chemical etching, and liquid
honing, and the most preferred method is to use electrolytic etching. In addition,
it is preferable to conduct electrolytic etching after brush graining, as disclosed
in J.P. KOKAI No. Sho 54-63902.
[0073] An aqueous solution comprising an acid, an alkali or salts thereof, or an aqueous
solution comprising an organic solvent may be used as an electrolytic solution used
for the electrolytic etching. A preferred electrolytic solution is a solution comprising
hydrochloric acid, nitric acid or salts thereof. The surface-roughened aluminum plate
may be optionally desmutted with an acid solution or alkaline solution.
[0074] The surface of the thus obtained aluminum plate is desirably subjected to anodization,
and in particular, the aluminum plate is preferably bathed in a solution comprising
a sulfuric acid or phosphoric acid. Also, if necessary, the aluminum plate is further
subjected to treatments such as a treatment with a silicate (e.g., sodium or potassium
silicate) as disclosed in U.S. Patent Nos. 2,714,066 and 3,181,461; a treatment with
potassium fluorozirconate as disclosed in U.S. Patent No. 2,946,638; a treatment with
phosphomolybdate as disclosed in U.S. Patent No. 3,201,247; a treatment with an alkyl
titanate as disclosed in U.K. Patent No. 1,108,559; a treatment with polyacrylic acid
as disclosed in German Patent No. 1,091,443; a treatment with polyvinylphosphonic
acid as disclosed in German Patent No. 1,134,093 and U.K. Patent No. 1,230,447; a
treatment with a phosphonic acid as disclosed in J.P. KOKOKU No. Sho 44-6409; a treatment
with a phytic acid as disclosed in U.S. Patent No. 3,307,951; and a treatment with
a divalent metal salt of hydrophilic organic polymer as disclosed in J.P. KOKAI Nos.
Sho 58-16893 and Sho 58-16291.
[0075] Examples of other hydrophilization treatments include silicate electrodeposition
as disclosed in U.S. Patent No. 3,658,662. Moreover, the aluminum plate is preferably
subjected to sealing treatment after the surface-graining and anodization treatments.
Such sealing treatment may be performed by immersing the aluminum plate in a hot water
or a hot aqueous solution containing an inorganic or organic salt, or by treating
the plate in a steam bath.
[0076] More particularly, a substrate suitable for use in the present invention may be prepared
by immersing a 1S aluminum plate comprising 0.1 to 0.5% by weight iron, 0.03 to 0.3%
by weight silicon, 0.001 to 0.03% by weight copper and 0.002 to 0.1% by weight titanium,
in a solution comprising an alkali, preferably sodium hydroxide, potassium hydroxide,
sodium carbonate or sodium silicate, each in an amount ranging from 1 to 30% by weight,
at 20 to 80°C for 5 to 250 seconds to etch the plate. Aluminum may be added to the
etching bath in an amount of twenty percent based on the alkali amount. Then, the
plate may be immersed in a solution comprising nitric acid or sulfuric acid in an
amount ranging from 10 to 30 % by weight at 20 to 70°C for 5 to 250 seconds to neutralize
and to remove smut after alkali etching.
[0077] After the surface of the aluminum plate is cleaned, the plate may be surface-grained
as follows. A preferred surface-graining treatment may be brush graining and/or electrolytic
etching. In the brush graining, a suspension of pumice stone in water is preferably
used and the resulting average roughness of the surface preferably ranges from 0.25
to 0.9 µm. An electrolytic solution used for the electrolytic etching may be an aqueous
solution of hydrochloric acid or nitric acid. The amount of the electrolytic solution
to be used preferably ranges from 0.01 to 3% by weight and more preferably from 0.05
to 2.5% by weight.
[0078] The electrolytic solution may comprise, if necessary, an anticorrosive agent (or
a stabilizing agent), or a leveling agent for graining such as nitrate, chloride,
monoamines, diamines, aldehydes, phosphoric acid, chromic acid, boric acid, and ammonium
salt of oxalic acid. In addition, the electrolytic solution may comprise an aluminum
ion in a suitable amount (1 to 10 g/l).
[0079] Generally, the treatment of the aluminum plate with the aforementioned electrolytic
solution is conducted at the temperature of 10 to 60°C. Alternating current used in
the treatment may be any wave such as a square wave, trapezoid wave and sine wave,
provided that the positive and negative polarities are alternated in turn. A single-phase
and three-phase alternating current that is a typical and commercially available one
can be utilized. It is desirable to treat the plate with the current having current
density of 5 to 100A/dm
2 for 10 to 300 seconds.
[0080] The roughness of the surface of an aluminum alloy substrate utilized in the present
invention may be adjusted to the range of 0.2 to 0.8 µm by controlling the electrical
quantity. Thus surface-grained aluminum alloy may be preferably treated with 10 to
50% hot sulfuric acid (40 to 60°C) or a diluted alkali (e.g., sodium hydroxide) to
remove the smut adhered to the surface thereof. If the smut is removed from the surface
of the aluminum alloy by treating it with alkali, the plate is subsequently immersed
in an acid (nitric acid or sulfuric acid) to be neutralized.
[0081] After the smut on the aluminum alloy surface is removed, an anodized film may be
formed on the aluminum alloy surface. Any of the conventionally well-known methods
for anodization can be used for forming the anodized film. However, sulfuric acid
is the most useful electrolyte for anodization while phosphoric acid is the second
most useful. In addition, a mixture of sulfuric acid and phosphoric acid as disclosed
in J.P. KOKAI No. Sho 55-28400 is also a useful electrolyte for anodization in the
present invention.
[0082] Generally, the anodization with sulfuric acid can be conducted using direct current,
but it is also possible to use an alternate current. In the anodization with sulfuric
acid, the plate is treated with sulfuric acid at a concentration of 5 to 30 % by weight
at 20 to 60°C for 5 to 250 seconds to obtain an oxidized film in an amount ranging
from 1 to 10 g/m
2. The electrolytic solution preferably comprises an aluminum ion and moreover, in
such a case, the electric current density to be used preferably ranges from 1 to 20
A/dm
2.
[0083] The anodization with phosphoric acid may be conducted at a concentration of 5 to
50% by weight at 30 to 60°C for 10 to 30 seconds with an electric current density
of 1 to 15 A/dm
2. It is desirable that the thus treated aluminum substrate may be further surface-treated
with silicates as disclosed in U.S. Patent No. 2,714,066.
[0084] A coating layer of an organic polymer may be applied onto the back face of the presensitized
plate of the present invention (hereinafter referred to as the "back coat layer")
to prevent elution of the anodized film from the aluminum plate during the development
of the presensitized plate and to prevent the occurrence of defects upon handling
the plates while arranging them in layers. Materials used for the back coat layer
are organic polymers insoluble in water and alkaline developers as disclosed in Japanese
Patent Application No. Hei 2-327111. The thickness of the back coat layer may be in
such a range that the elution of the anodized film from the aluminum plate during
the development of the presensitized plate can be inhibited, and may preferably range
from 0.01 to 50µm and more preferably from 0.05 to 10µm. A variety of methods for
applying the back coat layer on the backside of the aluminum substrate can be utilized.
Among them, the most preferred method to make the thickness of the back coat layer
in the aforementioned amount is to prepare a coating solution and to apply the solution
on the aluminum substrate followed by drying.
[0085] In the present invention, a base coat layer comprising the following compound may
be preferably formed on a surface of a substrate. Examples of the compound to be used
for the basecoat layer include carboxymethylcellulose, dextrin, gum arabic, phosphonic
acids comprising an amino group such as 2-aminoethylphosphonic acid, organic phosphonic
acids such as optionally substituted phenylphosphonic acid, naphthylphosphonic acid,
alkylphosphonic acid, glycerophosphonic acid, methylenediphosphonic acid and ethylenediphosphonic
acid, organic phosphoric acid such as optionally substituted phenylphosphoric acid,
naphthylphosphoric acid, alkylphosphoric acid and glycerophosphoric acid, organic
phosphinic acid such as optionally substituted phenylphosphinic acid, naphthylphosphinic
acid, alkylphosphinic acid and glycerophosphinic acid, amino acids such as glycine
and β-alanine, hydrochloric acid salt of hydroxyl group-containing amines such as
hydrochloric acid salt of triethanolamine, water-soluble polymer containing a sulfonic
acid group as described in J.P. KOKAI No. Sho 59-101651, and acidic dyes as described
in J.P. KOKAI No. Sho 60-64352.
[0086] The base coat layer may be formed on a substrate by coating on a substrate a solution
prepared by dissolving the compounds described above in a solvent such as water, methanol,
ethanol, methyl ethyl ketone and mixtures thereof, followed by drying. Moreover, a
yellow dye can be added to the solution to improve tone reproduction of the presensitized
plates. In general, the amount of the base coat layer ranges from about 2 to 200 mg/m
2, and preferably 5 to 100 mg/m
2 (expressed in terms of the dry solid contents).
[0087] Further, a mat layer is preferably formed on the surface of the photosensitive layer,
wherein the mat layer is comprised of risings each of which is formed separately.
The purpose of the mat layer is to improve the adhesiveness between a negative-image
film and the presensitized plate during contact exposure to light to reduce the time
required for evacuation using a vacuum printing frame and to prevent the association
of image micro dots.
[0088] The mat layer may be coated on a substrate by methods such as heat fusion of solid
powder as disclosed in J.P. KOKAI No. Sho 55-12974, and spraying and drying of water
comprising a polymer as disclosed in J.P. KOKAI No. Sho 58-182636. Although any method
for forming the mat layer can be utilized, it is desirable for the mat layer to be
formed to be soluble in an aqueous alkaline developer comprising substantially no
organic solvent, or removable by the developer.
[0089] The photosensitive composition coated on a substrate as described above is exposed
to light through a transparent original film comprising line and dot images. Then,
it is developed with an aqueous alkaline developer comprising alkanolamine described
above to obtain a negative relief image.
[0090] Hereinafter, the present invention will be described in detail with reference to
Examples including methods for preparing the organic polymer and the lithographic
printing plate of the present invention.
[Examples]
Preparation Examples
Preparation of polyvinyl acetal resin (A):
[0091] In a one-liter volume three-neck round bottom flask equipped with a thermometer,
a condenser and an agitator, polyvinyl formal (20 g) (Vinylec B-2, Chisso Co. Ltd.)
was dissolved in acetic acid (240 ml) to form a mixture. The reaction temperature
was maintained at 100°C and maleic anhydride (16.9g) and sodium acetate (18.0g) were
added to the mixture. The reaction was continued for 4 hours. The resulting solution
was added portionwise to 4-L solvent that was a mixture of methanol and water (1:3),
to precipitate a polymer. Thus obtained solid was dried under vacuum to obtain the
desired polymer (21.5 g). The acid content of the polymer was 1.5 meq/g.
Preparation of polyvinyl acetal resin (B):
[0092] In a one-liter volume three-neck round bottom flask equipped with a thermometer,
a condenser and an agitator, polyvinyl butyral (60 g) was dissolved in an acetic acid
(720 ml) under a heating condition to make a mixture. The reaction temperature was
maintained at 100°C and phthalic anhydride (89.8g) and sodium acetate (60.5g) were
added to the mixture. The reaction was continued for 3 hours. The resulting solution
was added portionwise to 10 L solvent that was a mixture of methanol and water (1:3),
to precipitate a polymer. Thus obtained solid was dried under a vacuum to obtain a
polymer (64.8 g). The acid content of the polymer was 2.72 meq/g. Next, the modified
polyvinyl butyral (45 g) was dissolved in 450 ml DMF under a heating condition to
make a mixture. After the temperature of the mixture was adjusted to 80°C, potassium
carbonate (6.91 g) and ethylene bromohydrin (6.24 g) was added to the mixture and
the reaction was continued for 3 hours. The solution was added portionwise to 5 L
solvent that was a mixture of water and acetic acid (19:1), to precipitate a polymer.
The solid was dried under a vacuum to obtain the desired polymer (38.4 g). The acid
content of the polymer was 1.48 meq/g.
Preparation of polyvinyl acetal resin (C):
[0093] In a one-liter volume three-neck round bottom flask equipped with a thermometer,
a condenser and an agitator, polyvinyl butyral (40 g) (DENKABUTYRAL #4000-2, Denki
Kagaku Kogyo Co. Ltd.) was dissolved in anhydrous tetrahydrofuran (600 ml) under a
heating condition to make a reaction mixture. A mixture of propenylsulfonylisocyanate
(18 g) and tetrahydrofuran (100 g) was added to the reaction mixture and the reaction
was continued for 4 hours at room temperature. The resulting solution was added portionwise
to 10 L water to precipitate a polymer. Thus obtained solid was dried under a vacuum
to obtain the desired polymer (49.8 g). The acid content of the polymer was 2.51 meq/g.
Preparation of urethane resin (A):
[0094] In a 500 ml volume three-neck round bottom flask equipped with a condenser and an
agitator, 2,2-bis(hydroxymethyl)propionic acid (11.5g, 86mmol), diethylene glycol
ether (7.26g, 68.4mmol) and 1,4-butanediol (4.11g, 45.6mmol) were dissolved in N,N-dimethylacetamide
(118 g) to make a mixture. 4,4'-Diphenylmethane diisocyanate (30.8g, 123mmol), hexamethylene
diisocyanate (13.8g, 81.9mmol) and di-n-butyltin dilaurate (0.1g) as a catalyst were
added to the mixture. The mixture was heated at 90°C for 7 hours while stirring it.
To the reaction mixture, 100ml N,N-dimethylacetamide, 50ml methanol and 50ml acetic
acid were added. After being stirred, the mixture was poured into 4 L water while
stirring it to precipitate a white polymer. The polymer was filtered, washed with
water and dried under a vacuum to obtain a urethane resin (62 g).
Preparation of acrylic resin (A):
[0095] Under a nitrogen stream, dioxane (300 g) was heated to 100°C and a mixture of 2-hydroxyethyl
methacrylate (150 g), acrylonitrile (60 g), methyl methacrylate (79.5 g), methacrylic
acid (10.5 g) and benzoyl peroxide (1.2 g) was added dropwise to the dioxane over
2 hours. After the addition was completed, the reaction mixture was diluted with methanol
and poured into water to precipitate a copolymer and the copolymer was dried under
a vacuum at 70°C.
Example 1
[0096] A surface of a JIS1050 aluminum sheet (plate) was grained with a rotary nylon brush
using a suspension of pumice stone in water as an abrasive. The roughness of the thus
treated surface of the plate (Ra) was 0.5 µm. After being washed with water, the aluminum
plate was immersed in an aqueous solution of 10% sodium hydroxide at 70°C to etch
the plate until the amount of dissolved aluminum became 6 g/m
2. After being washed with water, the aluminum plate was then immersed in a 30% aqueous
solution of nitric acid for 1 minute to neutralize the plate and washed completely
with water. Then, an electrolytic graining of the plate was conducted in a 0.7% aqueous
solution of nitric acid using rectangle alternating continuous wave voltage with an
anode voltage of 13 volts and a cathode voltage of 6 volts for 20 seconds. The plate
was then immersed in a 20% nitric acid at 50°C to wash its surface, followed by washing
it with water. Further, the plate was anodized in a 20% aqueous solution of nitric
acid using a direct current to form a porous anodized layer. Electrolysis of the plate
was conducted by using an electric current density of 5A/dm
2 and suitably controlling an amount of time for electrolysis to obtain a substrate
having an anodized layer in an amount of 2.5g/m
2. This substrate was treated with a 0.5% aqueous solution of polyvinylphosphoric acid
at 60°C for 5 seconds, washed completely with water and then dried.
[0097] On the substrate prepared as described above, a "Coating solution for photosensitive
layer (I)" was applied by a rotary applicator so that the amount of the coating became
1.5 g/m
2 as dry weight and dried at 100°C for 1 minute to obtain a presensitized plate useful
for making a lithographic printing plate. The presensitized plate was imagewise exposed
by PS light (Fuji Photo Film Co. Ltd.) at a distance of 1 m from the plate for 1 minute,
with a Step Tablet (Step Guide available from Fuji Photo Film Co. Ltd., comprising
15 steps and having an optical density difference of 0.15) being close in contact
with the plate.
[0098] Then, the plate was immersed in a 5 L developer having components shown in "Developer
composition (I)" for 10 seconds and immediately washed with water. Next, the plate
was treated with the gum referred to as a "Coating solution for desensitizing the
plate to grease (I)" using an automatic gumming up machine (G-800H, Fuji Photo Film
Co. Ltd.) to obtain a lithographic printing plate. The solid was observed at the 4
th step of the Step Tablet.
[0099] Then the plate was printed using the SOR-M printer (available from Heidelberg) and
Geos (N) black ink (available from Dainippon Ink and Chemicals, Inc.) on quality paper
to obtain 50,000 good prints.
[0100] The plate was continuously developed in the same way as described above. It was possible
to develop 220m
2 of the plate without any problem, but the developability of the developer was deteriorated
(that is, the non-image area could not be removed) when 230m
2 was treated with the developer.
Coating solution for photosensitive layer (I) |
|
Polyvinyl acetal resin (A) |
5g |
Dodecylbenzenesulfonic acid salt of condensation product of 4-diazodiphenylamine and
formaldehyde |
1.2g |
Propane-1,2,3-tricarboxylic acid |
0.05g |
Phosphoric acid |
0.05g |
4-Sulfophthalic acid |
0.05g |
Tricresil phosphate |
0.25g |
Half ester of styrene-maleic anhydride copolymer with n-hexanol |
0.1g |
Victoria Pure Blue BOH |
0.18g |
Megafac F-177 (Dainippon Ink and Chemicals, Inc.) |
0.015g |
1-Methoxy-2-propanol |
20g |
Methanol |
40g g |
Methyl ethyl ketone |
40g |
Ion exchanged water |
1g |
Developer composition (I) |
|
Sodium sulfite |
1g |
Benzyl alcohol |
40g |
Triethanolamine |
40g |
Sodium isopropylnaphthalenesulfonate |
12g |
Ion exchanged water |
1000g |
Coating solution for desensitizing the plate to grease (I) |
|
Gum arabic |
5g |
White dextrin |
30g |
Ethylene glycol |
10g |
Phosphoric acid |
3g |
Ion exchanged water |
1000g |
Example 2
[0101] The preparation method disclosed in Example 1 was repeated, except that a "Coating
solution for photosensitive layer (II)" was substituted for the "Coating solution
for photosensitive layer (I)" to obtain a presensitized plate useful for making a
lithographic printing plate as disclosed in Example 1. Thus obtained plate was imagewise
exposed to light, developed with the developer and treated with the gumming up solution
as disclosed in Example 1. The solid was observed at the 4
th step of Step Tablet
[0102] The plate was continuously developed in the same way as described in Example 1. It
was possible to develop 200m
2 of the plate without any problem, but the developability of the developer was deteriorated
(that is, the non-image area could not be removed) when 210m
2 was treated with the developer.
Coating solution for photosensitive layer (II) |
|
Polyvinyl acetal resin (B) |
5g |
Mesitylenesulfonic acid salt of polycondensate of 3-methoxy-4-diazodiphenylamine and
4,4'-bis-methoxymethyldiphenyl ether |
1.2g |
Propane-1,2,3-tricarboxylic acid |
0.05g |
Phosphoric acid |
0.05g |
4-Sulfophthalic acid |
0.05g |
Tricresil phosphate |
0.25g |
Half ester of styrene-maleic anhydride copolymer with n-hexanol |
0.1g |
Victoria Pure Blue BOH |
0.18g |
Megafac F-177 (Dainippon Ink and Chemicals, Inc.) |
0.015g |
1-Methoxy-2-propanol |
20g |
Methanol |
40g |
Methyl ethyl ketone |
40g |
Ion exchanged water |
1g |
Example 3
[0103] The preparation method disclosed in Example 1 was repeated, except that a "Coating
solution for photosensitive layer (III)" was substituted for the "Coating solution
for photosensitive layer (I)" to obtain a presensitized plate useful for making a
lithographic printing plate as disclosed in Example 1. Thus obtained plate was imagewise
exposed, developed and treated as disclosed in Example 1. The solid was observed at
the 4
th step of Step Tablet
[0104] The plate was continuously developed in the same way as described in Example 1. It
was possible to develop 210m
2 of the plate without any problem, but the developability of the developer was deteriorated
(that is, the non-image area could not be removed) when 220m
2 was treated with the developer.
Coating solution for photosensitive layer (III) |
|
Polyvinyl acetal resin (B) |
2.5g |
Acrylic resin (A) |
2.5g |
Dodecylbenzenesulfonic acid salt of condensation product of 4-diazodiphenylamine and
formaldehyde |
1.2g |
Oil Blue #603 (Orient Chemical Industries, Co. Ltd.) |
0.18g |
Malic acid |
0.05g |
Megafac F-177 (Dainippon Ink and Chemicals, Inc.) |
0.015g |
1-Methoxy-2-propanol |
30g |
Methyl ethyl ketone |
50g |
Methanol |
20g |
Example 4
[0105] The preparation method disclosed in Example 1 was repeated, except that "Coating
solution for photosensitive layer (IV)" was substituted for "Coating solution for
photosensitive layer (I)" to obtain a presensitized plate useful for making a lithographic
printing plate as disclosed in Example 1. Thus obtained plate was imagewise exposed,
developed and treated as disclosed in Example 1. The solid was observed at the 3
rd step of Step Tablet
[0106] The plate was continuously developed in the same way as described in Example 1. It
was possible to develop 230m
2 of the plate without any problem, but the developability of the developer was deteriorated
(that is, the non-image area could not be removed) when 240m
2 was treated with the developer.
Coating solution for photosensitive layer (IV) |
|
Polyvinyl acetal resin (C) |
2.5g |
Poly(allyl methacrylate/methacrylic acid) copolymer (mole ratio = 70/30) |
2.5g |
Pentaerythritol tetraacrylate |
1.5g |
Initiator of photopolymerization described below |
0.3g |
PF6 salt of condensation product of 4-diazodiphenylamine and formaldehyde |
0.2g |
Oil Blue #603 (Orient Chemical Industries, Co. Ltd.) |
0.15g |
Megafac F-177 (Dainippon Ink and Chemicals, Inc.) |
0.05g |
Phosphorous acid (50%) |
0.05g |
Behenic acid amide |
0.1g |
Ethylene glycol monomethyl ether |
50g |
Methyl ethyl ketone |
50g |
Methanol |
20g |
Initiator for photopolymerization
[0107]

Example 5
[0108] The preparation method disclosed in Example 1 was repeated, except that "Coating
solution for photosensitive layer (V)" was substituted for "Coating solution for photosensitive
layer (I)" and "Developer solution (II)" was substituted for "Developer solution (I)"
to obtain a presensitized plate useful for making a lithographic printing plate as
disclosed in Example 1. Thus obtained plate was imagewise exposed, developed and treated
as disclosed in Example 1. The solid was observed at the 3
rd step of Step Tablet
[0109] The plate was continuously developed in the same way as described in Example 1. It
was possible to develop 310 m
2 of the plate without any problem, but the developability of the developer was deteriorated
(that is, the non-image area could not be removed) when 320 m
2 was treated with the developer.
Coating solution for photosensitive layer (V) |
|
Urethane resin (A) |
2.5g |
Polyvinyl acetal resin (C) |
2.5g |
Dodecylbenzenesulfonic acid salt of co-condensation product of 3-methoxy-4-diazodiphenylamine/phenoxyacetic
acid=1/1 mole and formaldehyde |
1.2g |
Propane-1,2,3-tricarboxylic acid |
0.05g |
Phosphoric acid |
0.05g |
4-Sulfophthalic acid |
0.05g |
Tricresil phosphate |
0.25g |
Half ester of styrene-maleic anhydride copolymer with n-hexanol |
0.1g |
Victoria Pure Blue BOH |
0.18g |
Megafac F-177 (Dainippon Ink and Chemicals, Inc.) |
0.015g |
1-Methoxy-2-propanol |
20g |
Methanol |
40g |
Methyl ethyl ketone |
40g |
Ion exchanged water |
1g |
Developer solution (II) |
|
Sodium sulfite |
1g |
Benzyl alcohol |
40g |
Triethanolamine |
10g |
Monoethanolamine |
15g |
Sodium isopropylnaphthalenesulfonate |
12g |
Ion exchanged water |
1000g |
Example 6
[0110] The preparation method disclosed in Example 1 was repeated, except that "Coating
solution for photosensitive layer (VI)" was substituted for "Coating solution for
photosensitive layer (I)" to obtain a presensitized plate useful for making a lithographic
printing plate as disclosed in Example 1. Thus obtained plate was imagewise exposed,
developed and treated as disclosed in Example 1. The solid was observed at the 3
rd step of Step Tablet
[0111] The plate was continuously developed in the same way as described in Example 1. It
was possible to develop 270 m
2 of the plate without any problem, but the developability of the developer was deteriorated
(that is, the non-image area could not be removed) when 280 m
2 was treated with the developer.
Coating solution for photosensitive layer (VI) |
|
Urethane resin (A) |
5g |
Dodecylbenzenesulfonic acid salt of condensation product of 4-diazodiphenylamine and
formaldehyde |
1.2g |
Propane-1,2,3-tricarboxylic acid |
0.05g |
Phosphoric acid |
0.05g |
4-Sulfophthalic acid |
0.05g |
Tricresil phosphate |
0.25g |
Half ester of styrene-maleic anhydride copolymer with n-hexanol |
0.1g |
Victoria Pure Blue BOH |
0.18g |
Megafac F-177 (Dainippon Ink and Chemicals, Inc.) |
0.015g |
1-Methoxy-2-propanol |
20g |
Methanol |
40g |
Methyl ethyl ketone |
40g |
Ion exchanged water |
1g |
Comparative example 1
[0112] A presensitized plate useful for a lithographic printing plate was prepared as described
in Example 2 and the plate was imagewise exposed to light as described in Example
2.
[0113] Then, the plate was immersed in a 5 L developer having components shown in "Developer
composition (III)" for 10 seconds and immediately washed with water. Next, the plate
was treated with the gum shown as "Coating solution for desensitizing to grease (I)"
using an automatic gumming up machine (G-800H, Fuji Photo Film Co. Ltd.) to obtain
a lithographic printing plate. The solid was observed at the 2
nd step of Step Tablet
[0114] Then the plate was printed using SOR-M printer (Heidelberg) and Geos (N) black ink
(Dainippon Ink and Chemicals, Inc.) on quality paper to obtain 50,000 good prints.
[0115] The plate was continuously developed by the method described above. It was possible
to develop 120 m
2 of the plate without any problem, but the developability of the developer was deteriorated
(that is, the non-image area could not be removed) when 130 m
2 was treated with the developer.
Developer composition (III) |
|
Sodium sulfite |
1g |
Benzyl alcohol |
40g |
Triethanolamine |
16g |
Sodium isopropylnaphthalenesulfonate |
12g |
Ion exchanged water |
1000g |
[0116] The method for preparing a lithographic printing plate comprising; imagewise exposing
a negative-working presensitized plate useful for making a lithographic printing plate
having a specific photosensitive layer on a substrate and developing the imagewise
exposed plate with an aqueous alkaline developer comprising an alkanolamine in a specific
amount provides an effect to keep the ability of the developer high and the lithographic
printing plate without deterioration of printing durability and sensitivity. of the
lithographic printing plate.