(19)
(11) EP 1 229 303 A3

(12) EUROPEAN PATENT APPLICATION

(88) Date of publication A3:
25.06.2003 Bulletin 2003/26

(43) Date of publication A2:
07.08.2002 Bulletin 2002/32

(21) Application number: 02001730.7

(22) Date of filing: 25.01.2002
(51) International Patent Classification (IPC)7: G01B 11/02, G01B 11/08, G01B 21/00
(84) Designated Contracting States:
AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR
Designated Extension States:
AL LT LV MK RO SI

(30) Priority: 06.02.2001 US 777529

(71) Applicant: METRONICS, INC.
Bedford, NH 03110-6818 (US)

(72) Inventor:
  • Roelke, Richard
    Bedford, NH 03110 (US)

(74) Representative: Hofmann, Ernst 
Dr. Johannes Heidenhain GmbH, Patentabteilung, Postfach 12 60
83292 Traunreut
83292 Traunreut (DE)

   


(54) Calibration artifact and method of using the same


(57) A calibration artefact and a method of calibrating a machine vision measurement system. The calibration artifact includes a substrate and a number of concentric rings on one surface of the substrate. Each ring is of a different pre-defined size. The change in the size of any two adjacent rings is different than the change in size of any other two adjacent rings (Fig. 6).






Search report