METHOD FOR RAPID THERMAL PROCESSING OF SUBSTRATES - Patent 1234328

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EP 1 234 328 A2

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(88)	Date of publication A3:
	24.01.2002

(43)	Date of publication:
	28.08.2002 Bulletin 2002/35

(21)	Application number: 00992125.5

(22)	Date of filing: 23.10.2000

(51)	International Patent Classification (IPC)⁷: H01L 21/324

(86)	International application number:
	PCT/US0041/492

(87)	International publication number:
	WO 0103/5041 (17.05.2001 Gazette 2001/20)

(84)	Designated Contracting States:
	AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE
	Designated Extension States:
	AL LT LV MK RO SI

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Priority:

01.11.1999 US 162762 P
12.10.2000 US 689307

(71)	Applicant: Jetek, Inc.
	Ridgefield, CT 06877 (US)

(72)	Inventors:
	BOLLINGER, Lynn, David Ridgefield, CT 06877 (US) TOKMOULINE, Iskander New Fairfield, CT 06812 (US)

(74)	Representative: Metman, Karel Johannes
	De Vries & MetmanOverschiestraat 180 1062 XK Amsterdam 1062 XK Amsterdam (NL)

(54)	METHOD FOR RAPID THERMAL PROCESSING OF SUBSTRATES