(19)
(11) EP 1 235 947 A1

(12)

(43) Date of publication:
04.09.2002 Bulletin 2002/36

(21) Application number: 00970916.3

(22) Date of filing: 13.10.2000
(51) International Patent Classification (IPC)7: C23C 14/34
(86) International application number:
PCT/US0028/482
(87) International publication number:
WO 0102/9278 (26.04.2001 Gazette 2001/17)
(84) Designated Contracting States:
AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE

(30) Priority: 15.10.1999 US 159896 P

(71) Applicant: ADVANCED ENERGY INDUSTRIES, INC.
Fort Collins, CO 80525 (US)

(72) Inventors:
  • SCHOLL, Richard, A.
    Fort Collins, CO 80526 (US)
  • BELKIND, Abraham
    North Plainfield, NJ 07060 (US)

(74) Representative: Kador & Partner 
Corneliusstrasse 15
80469 München
80469 München (DE)

   


(54) METHOD AND APPARATUS FOR SUBSTRATE BIASING IN MULTIPLE ELECTRODE SPUTTERING SYSTEMS