ATMOSPHERIC PROCESS AND SYSTEM FOR CONTROLLED AND RAPID REMOVAL OF POLYMERS FROM HIGH DEPTH TO WIDTH ASPECT RATIO HOLES - Patent 1246710

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EP 1 246 710 A1

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(43)	Date of publication:
	09.10.2002 Bulletin 2002/41

(21)	Application number: 00967233.8

(22)	Date of filing: 28.09.2000

(51)	International Patent Classification (IPC)⁷: B23K 10/00

(86)	International application number:
	PCT/US0027/113

(87)	International publication number:
	WO 0102/3130 (05.04.2001 Gazette 2001/14)

(84)	Designated Contracting States:
	AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE
	Designated Extension States:
	AL LT LV MK RO SI

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Priority:

28.09.1999 US 156407 P

(71)	Applicant: Jetek, Inc.
	Ridgefield, CT 06877 (US)

(72)	Inventors:
	BOLLINGER, Lynn, David Ridgefield, CT 06877 (US) TOKMOULINE, Iskander New Fairfield, CT 06812 (US)

(74)	Representative: Metman, Karel Johannes
	De Vries & MetmanOverschiestraat 180 1062 XK Amsterdam 1062 XK Amsterdam (NL)

(54)	ATMOSPHERIC PROCESS AND SYSTEM FOR CONTROLLED AND RAPID REMOVAL OF POLYMERS FROM HIGH DEPTH TO WIDTH ASPECT RATIO HOLES