(19)
(11)
EP 1 250 712 A2
(12)
(88)
Date of publication A3:
03.01.2002
(43)
Date of publication:
23.10.2002
Bulletin 2002/43
(21)
Application number:
01904990.7
(22)
Date of filing:
19.01.2001
(51)
International Patent Classification (IPC)
7
:
H01L
21/306
,
H01L
21/00
(86)
International application number:
PCT/US0102/119
(87)
International publication number:
WO 0105/4181
(
26.07.2001
Gazette 2001/30)
(84)
Designated Contracting States:
AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR
Designated Extension States:
AL LT LV MK RO SI
(30)
Priority:
22.01.2000
US 490162
(71)
Applicant:
Loxley, Ted Albert
Wellston, OH 45692 (US)
(72)
Inventor:
Loxley, Ted Albert
Wellston, OH 45692 (US)
(74)
Representative:
Pratt, David Martin et al
Withers & Rogers,Goldings House,2 Hays Lane
London SE1 2HW
London SE1 2HW (GB)
(54)
PROCESS AND APPARATUS FOR CLEANING SILICON WAFERS