SELF-CLEANING PROCESS FOR ETCHING SILICON-CONTAINING MATERIAL - Patent 1256127

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EP 1 256 127 A1

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(43)	Date of publication:
	13.11.2002 Bulletin 2002/46

(21)	Application number: 01909235.2

(22)	Date of filing: 14.02.2001

(51)	International Patent Classification (IPC)⁷: H01L 21/3213, H01L 21/3065, H01L 21/311

(86)	International application number:
	PCT/US0104/774

(87)	International publication number:
	WO 0106/1740 (23.08.2001 Gazette 2001/34)

(84)	Designated Contracting States:
	AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR

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Priority:

18.02.2000 US 507629

(71)	Applicant: APPLIED MATERIALS, INC.
	Santa Clara,California 95052 (US)

(72)	Inventors:
	SHEN, Meihua Fremont, CA 94539 (US) JIANG, Wei-Nan San Jose, CA 94040 (US) YAUW, Oranna Sunnyvale, CA 94087 (US) CHINN, Jeffrey Foster City, CA 94404 (US)

(74)	Representative: Bayliss, Geoffrey Cyril
	BOULT WADE TENNANT,Verulam Gardens70 Gray's Inn Road London WC1X 8BT London WC1X 8BT (GB)

(54)	SELF-CLEANING PROCESS FOR ETCHING SILICON-CONTAINING MATERIAL