(19)
(11) EP 1 274 876 A2

(12)

(88) Date of publication A3:
07.02.2002

(43) Date of publication:
15.01.2003 Bulletin 2003/03

(21) Application number: 01923089.5

(22) Date of filing: 02.04.2001
(51) International Patent Classification (IPC)7: C23C 16/44, H01J 37/32, B08B 7/00
(86) International application number:
PCT/US0110/791
(87) International publication number:
WO 0107/5189 (11.10.2001 Gazette 2001/41)
(84) Designated Contracting States:
AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR

(30) Priority: 03.04.2000 US 541179

(71) Applicant: Applied Materials, Inc.
Santa Clara,California 95052 (US)

(72) Inventors:
  • SUN, Jennifer, Y.
    Sunnyvale, CA 94086 (US)
  • FANG, Ho, Tong
    San Jose, CA 95132 (US)
  • TAN, Samantha, S., H.
    Union City, CA 94587 (US)

(74) Representative: Kirschner, Klaus Dieter, Dipl.-Phys. 
Schneiders & BehrendtRechtsanwälte - PatentanwälteSollner Strasse 38
81479 München
81479 München (DE)

   


(54) CLEANING OF A PLASMA PROCESSING SYSTEM SILICON ROOF