(19)
(11) EP 1 279 069 A2

(12)

(88) Date of publication A3:
28.03.2002

(43) Date of publication:
29.01.2003 Bulletin 2003/05

(21) Application number: 01933046.3

(22) Date of filing: 04.05.2001
(51) International Patent Classification (IPC)7G03F 7/038, G03F 7/039, G03F 7/004
(86) International application number:
PCT/US0114/520
(87) International publication number:
WO 0108/6352 (15.11.2001 Gazette 2001/46)
(84) Designated Contracting States:
AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR
Designated Extension States:
AL LT LV MK RO SI

(30) Priority: 05.05.2000 US 201961 P

(71) Applicant: E.I. DU PONT DE NEMOURS AND COMPANY
WilmingtonDelaware 19898 (US)

(72) Inventors:
  • FRYD, Michael
    Philadelphia, PA 19106 (US)
  • PERIYASAMY, Mookkan
    Wilmington, DE 19810 (US)
  • SCHADT, Frank, Leonard, III
    Wilmington, DE 19806 (US)

(74) Representative: Towler, Philip Dean 
Frank B. Dehn & Co.,European Patent Attorneys,179 Queen Victoria Street
London EC4V 4EL
London EC4V 4EL (GB)

   


(54) POLYMERS FOR PHOTORESIST COMPOSITIONS FOR MICROLITHOGRAPHY