(19)
(11) EP 1 292 978 A2

(12)

(88) Date of publication A3:
27.06.2002

(43) Date of publication:
19.03.2003 Bulletin 2003/12

(21) Application number: 01946640.8

(22) Date of filing: 21.06.2001
(51) International Patent Classification (IPC)7: H01L 21/768, H01L 23/532
(86) International application number:
PCT/US0119/881
(87) International publication number:
WO 0109/9184 (27.12.2001 Gazette 2001/52)
(84) Designated Contracting States:
AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR

(30) Priority: 21.06.2000 US 598780

(71) Applicant: Infineon Technologies North America Corp.
San Jose, CA 95112-4508 (US)

(72) Inventors:
  • STETTER, Michael
    Fishkill, NY 12524 (US)
  • KALTALIOGLU, Erdem
    Wappingers Falls, NY 12590 (US)
  • COWLEY, Andy
    Wappingers Falls, NY 12590 (US)

(74) Representative: Epping Hermann & Fischer 
Ridlerstrasse 55
80339 München
80339 München (DE)

   


(54) DUAL DAMASCENE PROCESS UTILIZING A LOW-K DUAL DIELECTRIC