REDUCING DEPOSITION OF PROCESS RESIDUES ON A SURFACE IN A CHAMBER - Patent 1320867

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EP 1 320 867 A2

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(88)	Date of publication A3:
	15.08.2002

(43)	Date of publication:
	25.06.2003 Bulletin 2003/26

(21)	Application number: 01975321.9

(22)	Date of filing: 21.09.2001

(51)	International Patent Classification (IPC)⁷: H01J 37/32

(86)	International application number:
	PCT/US0129/802

(87)	International publication number:
	WO 0202/5696 (28.03.2002 Gazette 2002/12)

(84)	Designated Contracting States:
	AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR

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Priority:

21.09.2000 US 667362

(71)	Applicant: Applied Materials, Inc.
	Santa Clara,California 95052 (US)

(72)	Inventors:
	GRIMBERGEN, Michael, N. Redwood City, CA 94065 (US) QIAN, Xue-Yu San Jose, CA 95132 (US)

(74)	Representative: Zimmermann, Gerd Heinrich et al
	Zimmermann & Partner,P.O. Box 33 09 20 80069 München 80069 München (DE)

(54)	REDUCING DEPOSITION OF PROCESS RESIDUES ON A SURFACE IN A CHAMBER