(19)
(11) EP 1 323 182 A2

(12)

(88) Date of publication A3:
06.06.2002

(43) Date of publication:
02.07.2003 Bulletin 2003/27

(21) Application number: 01971981.4

(22) Date of filing: 30.08.2001
(51) International Patent Classification (IPC)7: H01L 21/00
(86) International application number:
PCT/EP0109/969
(87) International publication number:
WO 0202/3594 (21.03.2002 Gazette 2002/12)
(84) Designated Contracting States:
AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR

(30) Priority: 15.09.2000 US 663946

(71) Applicants:
  • Mattson Thermal Products Gmbh
    89160 Dorb (DE)
  • Mattson Thermal Products Inc.
    San Jose, CA 95134-2300 (US)

(72) Inventors:
  • ROTERS, Georg
    48249 Dülmen (DE)
  • DIETZ, Christoph
    89077 Ulm (DE)
  • CONOR, O'Carrol
    Sunnyvale, CA 94086 (US)
  • STROD, Arieh
    Cupertino, CA 95014 (US)
  • TAOKA, James
    San Jose, CA 95111 (US)
  • ZERNICKEL, Dieter
    D-73340 Amstetten (DE)

(74) Representative: Wagner & Geyer 
Gewürzmühlstrasse 5
D-80538 München
D-80538 München (DE)

   


(54) APPARATUS AND METHOD FOR REDUCING CONTAMINATION ON THERMALLY PROCESSED SEMICONDUCTOR SUBSTRATES