VAPOR DEPOSITION OF OXIDES, SILICATES AND PHOSPHATES - Patent 1327010

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(11)

EP 1 327 010 A2

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(88)	Date of publication A3:
	10.10.2002

(43)	Date of publication:
	16.07.2003 Bulletin 2003/29

(21)	Application number: 01975576.8

(22)	Date of filing: 28.09.2001

(51)	International Patent Classification (IPC)⁷: C23C 16/40

(86)	International application number:
	PCT/US0130/507

(87)	International publication number:
	WO 0202/7063 (04.04.2002 Gazette 2002/12)

(84)	Designated Contracting States:
	AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR

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Priority:

28.09.2000 US 236283 P
29.11.2000 US 253917 P

(71)	Applicant: PRESIDENT AND FELLOWS OF HARVARD COLLEGE
	Cambridge, MA 02138 (US)

(72)	Inventors:
	GORDON,Roy G. Cambridge,MA02138 (US) BECKER, Jill Cambridge, MA 02139 (US) HAUSMANN, Dennis Belmont, MA 02478 (US) SUH, Seigi Belmont, MA 02478 (US)

(74)	Representative: Holdcroft, James Gerald, Dr. et al
	Graham Watt & Co.St. Botolph's House7-9 St. Botolph's Road Sevenoaks, Kent TN13 3AJ Sevenoaks, Kent TN13 3AJ (GB)

(54)	VAPOR DEPOSITION OF OXIDES, SILICATES AND PHOSPHATES