(19)
(11) EP 1 327 498 A3

(12) EUROPEAN PATENT APPLICATION

(88) Date of publication A3:
08.10.2003 Bulletin 2003/41

(43) Date of publication A2:
16.07.2003 Bulletin 2003/29

(21) Application number: 03005490.2

(22) Date of filing: 08.04.1998
(51) International Patent Classification (IPC)7: B24B 37/04, B24B 41/06, B24B 55/02
(84) Designated Contracting States:
DE FR

(30) Priority: 08.04.1997 JP 10525297
08.04.1997 JP 10525397
08.04.1997 JP 10525497

(62) Application number of the earlier application in accordance with Art. 76 EPC:
98106478.5 / 0870576

(71) Applicant: EBARA CORPORATION
Ohta-ku, Tokyo (JP)

(72) Inventors:
  • Kimura, Norio
    Fujisawa-shi, Kanagawa-ken (JP)
  • Yasuda, Hozumi
    Fujisawa-shi, Kanagawa-ken (JP)

(74) Representative: Wagner, Karl H., Dipl.-Ing. et al
WAGNER & GEYER Patentanwälte Gewürzmühlstrasse 5
80538 München
80538 München (DE)

   


(54) Polishing apparatus


(57) A polishing apparatus for polishing a workpiece, said apparatus comprising:
a turntable (5) with a polishing cloth (6) mounted on an upper surface thereof;
a top ring (1) for holding a workpiece and pressing the workpiece against said polishing cloth under a first pressing force to polish the workpiece;
a presser ring (3) positioned outwardly of said top ring, said presser ring and said top ring making relative vertical movement eath other;
a pressing device for pressing said presser ring (3) against said polishing cloth (6) under a second pressing force (F2) which is variable; and
a cleaning liquid supply device (40) for supplying a cleaning liquid to a clearance (3h) between said top ring and said presser ring (3).






Search report