(19)
(11) EP 1 330 839 A2

(12)

(88) Date of publication A3:
01.05.2003

(43) Date of publication:
30.07.2003 Bulletin 2003/31

(21) Application number: 01987258.9

(22) Date of filing: 01.11.2001
(51) International Patent Classification (IPC)7: H01L 21/3065, H01J 37/32
(86) International application number:
PCT/US0146/210
(87) International publication number:
WO 0204/3116 (30.05.2002 Gazette 2002/22)
(84) Designated Contracting States:
AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR

(30) Priority: 01.11.2000 US 704887
01.11.2000 US 705254

(71) Applicant: Applied Materials, Inc.
Santa Clara,California 95052 (US)

(72) Inventors:
  • KUMAR, Ajay
    Sunnyvale, CA 95035 (US)
  • KHAN, Anisul
    Sunnyvale, CA 94087 (US)
  • OUYE, Alan
    San Mateo, CA 94401 (US)
  • WADENSWEILER, Ralph
    Sunnyvale, CA 94087 (US)
  • KUMAR, Ananda
    Milpitas, CA 95035 (US)
  • CHAFIN, Michael, G.
    San Jose, CA 95117 (US)
  • KHOLODENKO, Arnold
    San Francisco, CA 94132 (US)
  • PODLESNIK, Dragan, V.
    Palo Alto, CA 94304 (US)

(74) Representative: Bayliss, Geoffrey Cyril et al
BOULT WADE TENNANT,Verulam Gardens70 Gray's Inn Road
London WC1X 8BT
London WC1X 8BT (GB)

   


(54) ETCHING OF HIGH ASPECT RATIO FEATURES IN A SUBSTRATE